Inventor

KLOSTER GRANT

US24 patents

⚠️ This page may combine multiple inventors who share the name “KLOSTER GRANT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KLOSTER GRANT

INTEL CORP

Protecting metal conductors with sacrificial organic monolayers

Creating air gap in multi-level metal interconnects using electron beam to remove sacrificial material

Method of making semiconductor device using a novel interconnect cladding layer

Sealing porous dielectrics with silane coupling reagents

Sealing porous dielectric material using plasma-induced surface polymerization

Sealing porous dielectrics with silane coupling reagents

Low-k dielectric film with good mechanical strength

Thin passivation layer on 3D devices

Sealed three dimensional metal bonded integrated circuits

Selectively growing a polymeric material on a semiconductor substrate

Selective deposition utilizing sacrificial blocking layers for semiconductor devices

Method of bonding semiconductor devices

Plating a conductive material on a dielectric material

Plating a conductive material on a dielectric material

Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer

Sealing porous dielectric materials

Frame reveals with maskless lithography in the manufacture of integrated circuits

Backside wafer treatments to reduce distortions and overlay errors during wafer chucking

Deposition of diffusion barrier

Low-k dielectric film with good mechanical strength that varies in local porosity depending on location on substrate—therein

Sealing porous dielectric materials

Selective deposition utilizing sacrificial blocking layers for semiconductor devices

Aluminum incorporation in porous dielectric for improved mechanical properties of patterned dielectric

SHAH KUNAL

Polymer interlayer dielectric and passivation materials for a microelectronic device