P

Inventor

CHU KANG-SOO

KR11 patents

Patents

11 patents
US7084076B2Aug 1, 2006

Method for forming silicon dioxide film using siloxane

SAMSUNG ELECTRONICS CO LTD203 citations98
US6992019B2Jan 31, 2006

Methods for forming silicon dioxide layers on substrates using atomic layer deposition

SAMSUNG ELECTRONICS CO LTD68 citations97
US6858533B2Feb 22, 2005

Semiconductor device having an etch stopper formed of a sin layer by low temperature ALD and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD84 citations95
US7394641B2Jul 1, 2008

MEMS tunable capacitor with a wide tuning range

SAMSUNG ELECTRONICS CO LTD15 citations92
US7846790B2Dec 7, 2010

Method of fabricating semiconductor device having multiple gate dielectric layers and semiconductor device fabricated thereby

SAMSUNG ELECTRONICS CO LTD10 citations82
US7203052B2Apr 10, 2007

Method of fabricating MEMS tunable capacitor with wide tuning range

SAMSUNG ELECTRONICS CO LTD5 citations73
US7042698B2May 9, 2006

MEMS tunable capacitor with a wide tuning range and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD10 citations73
US7180190B2Feb 20, 2007

Electrode line structure having fine line width and method of forming the same

SAMSUNG ELECTRONICS CO LTD4 citations62
US6989231B2Jan 24, 2006

Method of forming fine patterns using silicon oxide layer

SAMSUNG ELECTRONICS CO LTD5 citations62
US7726777B2Jun 1, 2010

Inkjet print head and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD0 citations51
US7510969B2Mar 31, 2009

Electrode line structure having fine line width and method of forming the same

SAMSUNG ELECTRONICS CO LTD0 citations51