Inventor
SATO NOBUHIKO
JP113 patents
⚠️ This page may combine multiple inventors who share the name “SATO NOBUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
43 patentsUS6613678B1Sep 2, 2003
Process for manufacturing a semiconductor substrate as well as a semiconductor thin film, and multilayer structure
CANON KK225 citations99
US6221738B1Apr 24, 2001
Substrate and production method thereof
CANON KK168 citations99
US6171982B1Jan 9, 2001
Method and apparatus for heat-treating an SOI substrate and method of preparing an SOI substrate by using the same
CANON KK142 citations99
US6143628ANov 7, 2000
Semiconductor substrate and method of manufacturing the same
CANON KK181 citations99
US5869387AFeb 9, 1999
Process for producing semiconductor substrate by heating to flatten an unpolished surface
CANON KK208 citations99
US5854123ADec 29, 1998
Method for producing semiconductor substrate
CANON KK631 citations99
US7164183B2Jan 16, 2007
Semiconductor substrate, semiconductor device, and method of manufacturing the same
CANON KK86 citations98
US6350703B1Feb 26, 2002
Semiconductor substrate and production method thereof
CANON KK106 citations98
US6326279B1Dec 4, 2001
Process for producing semiconductor article
CANON KK154 citations98
US6313014B1Nov 6, 2001
Semiconductor substrate and manufacturing method of semiconductor substrate
CANON KK99 citations98
US6246068B1Jun 12, 2001
Semiconductor article with porous structure
CANON KK91 citations98
US6143629ANov 7, 2000
Process for producing semiconductor substrate
CANON KK119 citations98
US5750000AMay 12, 1998
Semiconductor member, and process for preparing same and semiconductor device formed by use of same
CANON KK117 citations98
US6828214B2Dec 7, 2004
Semiconductor member manufacturing method and semiconductor device manufacturing method
CANON KK96 citations97
US6369905B1Apr 9, 2002
Information processing apparatus and output apparatus
CANON KK102 citations97
US6605518B1Aug 12, 2003
Method of separating composite member and process for producing thin film
CANON KK63 citations96
US6569748B1May 27, 2003
Substrate and production method thereof
CANON KK46 citations96
US6375738B1Apr 23, 2002
Process of producing semiconductor article
CANON KK62 citations96
US6309945B1Oct 30, 2001
Process for producing semiconductor substrate of SOI structure
CANON KK56 citations96
US6180497B1Jan 30, 2001
Method for producing semiconductor base members
CANON KK66 citations96
US6121117ASep 19, 2000
Process for producing semiconductor substrate by heat treating
CANON KK72 citations96
US6103598AAug 15, 2000
Process for producing semiconductor substrate
CANON KK61 citations96
US5970361AOct 19, 1999
Process for producing semiconductor device having porous regions
CANON KK57 citations96
US5767020AJun 16, 1998
Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution
CANON KK83 citations96
US6606466B2Aug 12, 2003
Print control apparatus indicating appropriate paper cassette for printing and method of same
CANON KK38 citations93
US6593211B2Jul 15, 2003
Semiconductor substrate and method for producing the same
CANON KK53 citations93
US6506665B1Jan 14, 2003
Method and apparatus for heat-treating an SOI substrate and method of preparing an SOI substrate by using the same
CANON KK35 citations93
US6468663B1Oct 22, 2002
Semiconductor substrate and process for producing the same
CANON KK15 citations93
US6413874B1Jul 2, 2002
Method and apparatus for etching a semiconductor article and method of preparing a semiconductor article by using the same
CANON KK49 citations93
US6407367B1Jun 18, 2002
Heat treatment apparatus, heat treatment process employing the same, and process for producing semiconductor article
CANON KK40 citations93
US6335269B1Jan 1, 2002
Semiconductor substrate and method for producing the same
CANON KK43 citations93
US6171512B1Jan 9, 2001
Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution
CANON KK18 citations93
US6136684AOct 24, 2000
Semiconductor substrate and process for production thereof
CANON KK33 citations93
US6106613AAug 22, 2000
Semiconductor substrate having compound semiconductor layer, process for its production, and electronic device fabricated on semiconductor substrate
CANON KK41 citations93
US5290712AMar 1, 1994
Process for forming crystalline semiconductor film
CANON KK37 citations93
US6717693B2Apr 6, 2004
Information processing apparatus and output apparatus
CANON KK21 citations92
US6660606B2Dec 9, 2003
Semiconductor-on-insulator annealing method
CANON KK25 citations92
US5825993AOct 20, 1998
Information processing apparatus and output apparatus
CANON KK27 citations92
US6639327B2Oct 28, 2003
Semiconductor member, semiconductor device and manufacturing methods thereof
CANON KK45 citations91
US9917140B2Mar 13, 2018
Photo electric converter imaging system and method for manufacturing photoelectric converter
CANON KK5 citations84
US6667812B1Dec 23, 2003
Information processing apparatus with device control language based program selection
CANON KK13 citations84
US7636993B2Dec 29, 2009
Method for producing a piezoelectric film actuator
CANON KK8 citations83
US7008701B2Mar 7, 2006
Semiconductor member manufacturing method and semiconductor device manufacturing method
CANON KK12 citations83
HITACHI LTD
1 patentBRIDGESTONE SPORTS CO LTD
1 patentCANON KABUHSIKI KAISHA
1 patentDAIFUKU KK
1 patentSHIKINA NORIYUKI
1 patentNAGAYAMA KOHEI
1 patentPANASONIC CORP
1 patentShowing the top 50 of 113 patents by PatentIndex Score.