P

Inventor

SATO NOBUHIKO

JP113 patents
⚠️ This page may combine multiple inventors who share the name “SATO NOBUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CANON KK

43 patents
US6613678B1Sep 2, 2003

Process for manufacturing a semiconductor substrate as well as a semiconductor thin film, and multilayer structure

CANON KK225 citations99
US6221738B1Apr 24, 2001

Substrate and production method thereof

CANON KK168 citations99
US6171982B1Jan 9, 2001

Method and apparatus for heat-treating an SOI substrate and method of preparing an SOI substrate by using the same

CANON KK142 citations99
US6143628ANov 7, 2000

Semiconductor substrate and method of manufacturing the same

CANON KK181 citations99
US5869387AFeb 9, 1999

Process for producing semiconductor substrate by heating to flatten an unpolished surface

CANON KK208 citations99
US5854123ADec 29, 1998

Method for producing semiconductor substrate

CANON KK631 citations99
US7164183B2Jan 16, 2007

Semiconductor substrate, semiconductor device, and method of manufacturing the same

CANON KK86 citations98
US6350703B1Feb 26, 2002

Semiconductor substrate and production method thereof

CANON KK106 citations98
US6326279B1Dec 4, 2001

Process for producing semiconductor article

CANON KK154 citations98
US6313014B1Nov 6, 2001

Semiconductor substrate and manufacturing method of semiconductor substrate

CANON KK99 citations98
US6246068B1Jun 12, 2001

Semiconductor article with porous structure

CANON KK91 citations98
US6143629ANov 7, 2000

Process for producing semiconductor substrate

CANON KK119 citations98
US5750000AMay 12, 1998

Semiconductor member, and process for preparing same and semiconductor device formed by use of same

CANON KK117 citations98
US6828214B2Dec 7, 2004

Semiconductor member manufacturing method and semiconductor device manufacturing method

CANON KK96 citations97
US6369905B1Apr 9, 2002

Information processing apparatus and output apparatus

CANON KK102 citations97
US6605518B1Aug 12, 2003

Method of separating composite member and process for producing thin film

CANON KK63 citations96
US6569748B1May 27, 2003

Substrate and production method thereof

CANON KK46 citations96
US6375738B1Apr 23, 2002

Process of producing semiconductor article

CANON KK62 citations96
US6309945B1Oct 30, 2001

Process for producing semiconductor substrate of SOI structure

CANON KK56 citations96
US6180497B1Jan 30, 2001

Method for producing semiconductor base members

CANON KK66 citations96
US6121117ASep 19, 2000

Process for producing semiconductor substrate by heat treating

CANON KK72 citations96
US6103598AAug 15, 2000

Process for producing semiconductor substrate

CANON KK61 citations96
US5970361AOct 19, 1999

Process for producing semiconductor device having porous regions

CANON KK57 citations96
US5767020AJun 16, 1998

Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution

CANON KK83 citations96
US6606466B2Aug 12, 2003

Print control apparatus indicating appropriate paper cassette for printing and method of same

CANON KK38 citations93
US6593211B2Jul 15, 2003

Semiconductor substrate and method for producing the same

CANON KK53 citations93
US6506665B1Jan 14, 2003

Method and apparatus for heat-treating an SOI substrate and method of preparing an SOI substrate by using the same

CANON KK35 citations93
US6468663B1Oct 22, 2002

Semiconductor substrate and process for producing the same

CANON KK15 citations93
US6413874B1Jul 2, 2002

Method and apparatus for etching a semiconductor article and method of preparing a semiconductor article by using the same

CANON KK49 citations93
US6407367B1Jun 18, 2002

Heat treatment apparatus, heat treatment process employing the same, and process for producing semiconductor article

CANON KK40 citations93
US6335269B1Jan 1, 2002

Semiconductor substrate and method for producing the same

CANON KK43 citations93
US6171512B1Jan 9, 2001

Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution

CANON KK18 citations93
US6136684AOct 24, 2000

Semiconductor substrate and process for production thereof

CANON KK33 citations93
US6106613AAug 22, 2000

Semiconductor substrate having compound semiconductor layer, process for its production, and electronic device fabricated on semiconductor substrate

CANON KK41 citations93
US5290712AMar 1, 1994

Process for forming crystalline semiconductor film

CANON KK37 citations93
US6717693B2Apr 6, 2004

Information processing apparatus and output apparatus

CANON KK21 citations92
US6660606B2Dec 9, 2003

Semiconductor-on-insulator annealing method

CANON KK25 citations92
US5825993AOct 20, 1998

Information processing apparatus and output apparatus

CANON KK27 citations92
US6639327B2Oct 28, 2003

Semiconductor member, semiconductor device and manufacturing methods thereof

CANON KK45 citations91
US9917140B2Mar 13, 2018

Photo electric converter imaging system and method for manufacturing photoelectric converter

CANON KK5 citations84
US6667812B1Dec 23, 2003

Information processing apparatus with device control language based program selection

CANON KK13 citations84
US7636993B2Dec 29, 2009

Method for producing a piezoelectric film actuator

CANON KK8 citations83
US7008701B2Mar 7, 2006

Semiconductor member manufacturing method and semiconductor device manufacturing method

CANON KK12 citations83

HITACHI LTD

1 patent

BRIDGESTONE SPORTS CO LTD

1 patent

CANON KABUHSIKI KAISHA

1 patent

DAIFUKU KK

1 patent

SHIKINA NORIYUKI

1 patent

NAGAYAMA KOHEI

1 patent

PANASONIC CORP

1 patent

Showing the top 50 of 113 patents by PatentIndex Score.