Inventor
GROTE BERNHARD
US32 patents
⚠️ This page may combine multiple inventors who share the name “GROTE BERNHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NXP USA INC
26 patentsUS10103257B1Oct 16, 2018
Termination design for trench superjunction power MOSFET
NXP USA INC17 citations93
US10600911B2Mar 24, 2020
Field-effect transistor and method therefor
NXP USA INC7 citations82
US10522677B2Dec 31, 2019
Field-effect transistor and method therefor
NXP USA INC5 citations72
US10431678B2Oct 1, 2019
Termination design for trench superjunction power MOSFET
NXP USA INC4 citations72
US10424646B2Sep 24, 2019
Field-effect transistor and method therefor
NXP USA INC6 citations72
US11018247B1May 25, 2021
Semiconductor device with a base link region and method therefor
NXP USA INC3 citations71
US11777002B2Oct 3, 2023
Laterally-diffused metal-oxide semiconductor transistor and method therefor
NXP USA INC0 citations62
US11631763B2Apr 18, 2023
Termination for trench field plate power MOSFET
NXP USA INC0 citations62
US11329150B2May 10, 2022
Termination for trench field plate power MOSFET
NXP USA INC1 citations62
US11227921B2Jan 18, 2022
Laterally-diffused metal-oxide semiconductor transistor and method therefor
NXP USA INC1 citations62
US11217675B2Jan 4, 2022
Trench with different transverse cross-sectional widths
NXP USA INC0 citations62
US10833174B2Nov 10, 2020
Transistor devices with extended drain regions located in trench sidewalls
NXP USA INC1 citations57
US12538512B2Jan 27, 2026
Semiconductor device with current-carrying electrodes and a conductive element and method of fabrication therefor
NXP USA INC0 citations51
US12349433B2Jul 1, 2025
Transistors with self-aligned source-connected field plates
NXP USA INC0 citations51
US12191383B2Jan 7, 2025
Semiconductor device with an insulating region formed between a control electrode and a conductive element and method of fabrication therefor
NXP USA INC0 citations51
US12057499B2Aug 6, 2024
Transistor devices with termination regions
NXP USA INC0 citations51
US11387348B2Jul 12, 2022
Transistor formed with spacer
NXP USA INC0 citations51
US11329156B2May 10, 2022
Transistor with extended drain region
NXP USA INC0 citations51
US11075110B1Jul 27, 2021
Transistor trench with field plate structure
NXP USA INC0 citations51
US12464799B2Nov 4, 2025
Semiconductor device with a field plate having a recessed region and an overhanging portion and method of fabrication therefor
NXP USA INC0 citations50
US12342560B2Jun 24, 2025
Transistors with source-connected field plates
NXP USA INC0 citations44
US10749028B2Aug 18, 2020
Transistor with gate/field plate structure
NXP USA INC0 citations41
US10749023B2Aug 18, 2020
Vertical transistor with extended drain region
NXP USA INC0 citations41
US10607880B2Mar 31, 2020
Die with buried doped isolation region
NXP USA INC0 citations41
US10600879B2Mar 24, 2020
Transistor trench structure with field plate structures
NXP USA INC0 citations41
US10580856B2Mar 3, 2020
Structure for improved noise signal isolation
NXP USA INC0 citations39
NXP BV
5 patentsUS12148820B2Nov 19, 2024
Transistors with source-connected field plates
NXP BV4 citations71
US10418483B2Sep 17, 2019
Laterally diffused metal oxide semiconducting devices with lightly-doped isolation layers
NXP BV1 citations62
US12336254B2Jun 17, 2025
Semiconductor device with conductive elements formed over dielectric layers and method of fabrication therefor
NXP BV0 citations61
US11923424B2Mar 5, 2024
Semiconductor device with conductive elements formed over dielectric layers and method of fabrication therefor
NXP BV0 citations61
US12107143B2Oct 1, 2024
Semiconductor device with extrinsic base region and method of fabrication therefor
NXP BV0 citations51