Inventor
CARLSON DAVID W
US21 patents
⚠️ This page may combine multiple inventors who share the name “CARLSON DAVID W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
12 patentsUS6368193B1Apr 9, 2002
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC144 citations99
US6358127B1Mar 19, 2002
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC130 citations99
US6210257B1Apr 3, 2001
Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC274 citations99
US6193588B1Feb 27, 2001
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC154 citations99
US6394883B1May 28, 2002
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC22 citations92
US6634932B2Oct 21, 2003
Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC3 citations74
US6537136B1Mar 25, 2003
Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC6 citations74
US6893337B2May 17, 2005
Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC2 citations63
US6398630B1Jun 4, 2002
Planarizing machine containing web-format polishing pad and web-format polishing pads
MICRON TECHNOLOGY INC1 citations63
US7156727B2Jan 2, 2007
Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
MICRON TECHNOLOGY INC0 citations52
US6817928B2Nov 16, 2004
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC0 citations52
US6749489B2Jun 15, 2004
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC0 citations52
NAT SEMICONDUCTOR CORP
4 patentsUS6277236B1Aug 21, 2001
Light sensitive chemical-mechanical polishing apparatus and method
NAT SEMICONDUCTOR CORP7 citations74
US7307021B1Dec 11, 2007
Method for planarizing a thin film
NAT SEMICONDUCTOR CORP3 citations63
US6458291B2Oct 1, 2002
Light sensitive chemical-mechanical polishing aggregate
NAT SEMICONDUCTOR CORP4 citations63
US6458704B2Oct 1, 2002
Light sensitive chemical-mechanical polishing method
NAT SEMICONDUCTOR CORP3 citations63
FIRESTONE TIRE & RUBBER CO
2 patentsUS4237245ADec 2, 1980
Hydrogenated block copolymers of butadiene containing a block of 1,4 and a block of 1,2-microstructure
FIRESTONE TIRE & RUBBER CO55 citations96
US4226952AOct 7, 1980
Thermoplastic elastomer blends of alpha-olefin polymers and hydrogenated medium and high vinyl butadiene polymers
FIRESTONE TIRE & RUBBER CO144 citations96