Inventor
SOUTHWICK SCOTT A
US15 patents
Patents
15 patentsUS6368193B1Apr 9, 2002
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC144 citations99
US6358127B1Mar 19, 2002
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC130 citations99
US6193588B1Feb 27, 2001
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC154 citations99
US6350180B2Feb 26, 2002
Methods for predicting polishing parameters of polishing pads, and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization
MICRON TECHNOLOGY INC165 citations98
US5782675AJul 21, 1998
Apparatus and method for refurbishing fixed-abrasive polishing pads used in chemical-mechanical planarization of semiconductor wafers
MICRON TECHNOLOGY INC229 citations98
US6238273B1May 29, 2001
Methods for predicting polishing parameters of polishing pads and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization
MICRON TECHNOLOGY INC85 citations97
US7517754B2Apr 14, 2009
Methods of forming semiconductor constructions
MICRON TECHNOLOGY INC44 citations96
US6361400B2Mar 26, 2002
Methods for predicting polishing parameters of polishing pads, and methods and machines for planarizing microelectronic substrate assemblies in mechanical or chemical-mechanical planarization
MICRON TECHNOLOGY INC58 citations96
US7491641B2Feb 17, 2009
Method of forming a conductive line and a method of forming a conductive contact adjacent to and insulated from a conductive line
MICRON TECHNOLOGY INC20 citations92
US7341909B2Mar 11, 2008
Methods of forming semiconductor constructions
MICRON TECHNOLOGY INC37 citations92
US6394883B1May 28, 2002
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC22 citations92
US7118966B2Oct 10, 2006
Methods of forming conductive lines
MICRON TECHNOLOGY INC4 citations62
US6817928B2Nov 16, 2004
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC0 citations52
US6769967B1Aug 3, 2004
Apparatus and method for refurbishing polishing pads used in chemical-mechanical planarization of semiconductor wafers
MICRON TECHNOLOGY INC1 citations52
US6749489B2Jun 15, 2004
Method and apparatus for planarizing and cleaning microelectronic substrates
MICRON TECHNOLOGY INC0 citations52