Inventor

EMA TATSUHIKO

US14 patents

⚠️ This page may combine multiple inventors who share the name “EMA TATSUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

12 patents

US6709699B2Mar 23, 2004

Film-forming method, film-forming apparatus and liquid film drying apparatus

TOSHIBA KK27 citations92

US6506453B2Jan 14, 2003

Deposition method, deposition apparatus, and pressure-reduction drying apparatus

TOSHIBA KK25 citations92

US6372413B2Apr 16, 2002

Method for cleaning the surface of substrate to which residues of resist stick

TOSHIBA KK35 citations92

US7364839B2Apr 29, 2008

Method for forming a pattern and substrate-processing apparatus

TOSHIBA KK10 citations84

US7018481B2Mar 28, 2006

Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle

TOSHIBA KK13 citations83

US6800569B2Oct 5, 2004

Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus

TOSHIBA KK12 citations82

US7604832B2Oct 20, 2009

Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus

TOSHIBA KK7 citations73

US7312018B2Dec 25, 2007

Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus

TOSHIBA KK6 citations73

US6719844B2Apr 13, 2004

Deposition method, deposition apparatus, and pressure-reduction drying apparatus

TOSHIBA KK7 citations73

US6709531B2Mar 23, 2004

Chemical liquid processing apparatus for processing a substrate and the method thereof

TOSHIBA KK6 citations71

US7669608B2Mar 2, 2010

Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle

TOSHIBA KK4 citations62

US7067033B2Jun 27, 2006

Chemical liquid processing apparatus for processing a substrate

TOSHIBA KK2 citations60

NIKON CORP

1 patent

US6842281B2Jan 11, 2005

Observation device, ultraviolet microscope and observation method

NIKON CORP8 citations72

ITO SHINICHI

1 patent

US8071157B2Dec 6, 2011

Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus

ITO SHINICHI0 citations52