Inventor
TAKAHASHI RIICHIRO
JP11 patents
⚠️ This page may combine multiple inventors who share the name “TAKAHASHI RIICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
10 patentsUS6742944B2Jun 1, 2004
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
TOSHIBA KK13 citations92
US7727853B2Jun 1, 2010
Processing method, manufacturing method of semiconductor device, and processing apparatus
TOSHIBA KK10 citations84
US7288466B2Oct 30, 2007
Processing method, manufacturing method of semiconductor device, and processing apparatus
TOSHIBA KK11 citations84
US7018481B2Mar 28, 2006
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
TOSHIBA KK13 citations83
US6709531B2Mar 23, 2004
Chemical liquid processing apparatus for processing a substrate and the method thereof
TOSHIBA KK6 citations71
US7669608B2Mar 2, 2010
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
TOSHIBA KK4 citations62
US7399578B2Jul 15, 2008
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
TOSHIBA KK3 citations62
US7097960B2Aug 29, 2006
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
TOSHIBA KK1 citations62
US6818387B2Nov 16, 2004
Method of forming a pattern
TOSHIBA KK2 citations62
US7067033B2Jun 27, 2006
Chemical liquid processing apparatus for processing a substrate
TOSHIBA KK2 citations60