Inventor
SON EUN-KYUNG
KR2 patents
Patents
2 patentsUS7419761B2Sep 2, 2008
Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same
DONGJIN SEMICHEM CO LTD0 citations48
US7344820B2Mar 18, 2008
Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same
DONGJIN SEMICHEM CO LTD0 citations47