P

Inventor

KIM DEOG-BAE

KR17 patents
⚠️ This page may combine multiple inventors who share the name “KIM DEOG-BAE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DONGJIN SEMICHEM CO LTD

14 patents
US6924078B2Aug 2, 2005

Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion

DONGJIN SEMICHEM CO LTD463 citations98
US6767687B1Jul 27, 2004

Polymer for chemically amplified resist and a resist composition using the same

DONGJIN SEMICHEM CO LTD7 citations71
US7465531B2Dec 16, 2008

Polymer for forming anti-reflective coating layer

DONGJIN SEMICHEM CO LTD4 citations61
US7309561B2Dec 18, 2007

Polymer for forming anti-reflective coating layer

DONGJIN SEMICHEM CO LTD2 citations61
US7282530B2Oct 16, 2007

Polymer for forming anti-reflective coating layer

DONGJIN SEMICHEM CO LTD2 citations61
US7604919B2Oct 20, 2009

Monomer, polymer and composition for photoresist

DONGJIN SEMICHEM CO LTD2 citations60
US7569325B2Aug 4, 2009

Monomer having sulfonyl group, polymer thereof and photoresist composition including the same

DONGJIN SEMICHEM CO LTD3 citations60
US7368219B2May 6, 2008

Polymer for forming anti-reflective coating layer

DONGJIN SEMICHEM CO LTD2 citations60
US6743881B2Jun 1, 2004

Chemically amplified resist and a resist composition

DONGJIN SEMICHEM CO LTD2 citations60
US7745099B2Jun 29, 2010

Photosensitive compound and photoresist composition including the same

DONGJIN SEMICHEM CO LTD0 citations52
US7504195B2Mar 17, 2009

Photosensitive polymer and photoresist composition

DONGJIN SEMICHEM CO LTD0 citations51
US7419761B2Sep 2, 2008

Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same

DONGJIN SEMICHEM CO LTD0 citations48
US7344820B2Mar 18, 2008

Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same

DONGJIN SEMICHEM CO LTD0 citations47
US7297463B2Nov 20, 2007

Photosensitive polymer and chemically amplified photoresist composition including the same

DONGJIN SEMICHEM CO LTD1 citations47

ROH HYO-JUNG

1 patent

PARK JONG KYOUNG

1 patent

LEE JUN-GYEONG

1 patent