Inventor
TSAI CHENG KUN
TW23 patents
⚠️ This page may combine multiple inventors who share the name “TSAI CHENG KUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
12 patentsUS10691864B2Jun 23, 2020
Method of post optical proximity correction (OPC) printing verification by machine learning
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations82
US11048161B2Jun 29, 2021
Optical proximity correction methodology using pattern classification for target placement
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10360339B2Jul 23, 2019
Method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9411924B2Aug 9, 2016
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10520829B2Dec 31, 2019
Optical proximity correction methodology using underlying layer information
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10049178B2Aug 14, 2018
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US9026955B1May 5, 2015
Methodology for pattern correction
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US11308256B2Apr 19, 2022
Method of post optical proximity correction (OPC) printing verification by machine learning
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US9418191B2Aug 16, 2016
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10860774B2Dec 8, 2020
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10747938B2Aug 18, 2020
Method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10527928B2Jan 7, 2020
Optical proximity correction methodology using pattern classification for target placement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
TAIWAN SEMICONDUCTOR MFG
4 patentsUS9390217B2Jul 12, 2016
Methodology of optical proximity correction optimization
TAIWAN SEMICONDUCTOR MFG68 citations97
US8381153B2Feb 19, 2013
Dissection splitting with optical proximity correction and mask rule check enforcement
TAIWAN SEMICONDUCTOR MFG21 citations91
US9262578B2Feb 16, 2016
Method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG9 citations83
US8372742B2Feb 12, 2013
Method, system, and apparatus for adjusting local and global pattern density of an integrated circuit design
TAIWAN SEMICONDUCTOR MFG14 citations82
WANG HUNG-CHUN
3 patentsUS8627241B2Jan 7, 2014
Pattern correction with location effect
WANG HUNG-CHUN45 citations94
US8631360B2Jan 14, 2014
Methodology of optical proximity correction optimization
WANG HUNG-CHUN34 citations93
US8464186B2Jun 11, 2013
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
WANG HUNG-CHUN29 citations92