P

Inventor

MATZ LAURA M

US15 patents
⚠️ This page may combine multiple inventors who share the name “MATZ LAURA M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TEXAS INSTRUMENTS INC

3 patents
US7741224B2Jun 22, 2010

Plasma treatment and repair processes for reducing sidewall damage in low-k dielectrics

TEXAS INSTRUMENTS INC20 citations90
US7413994B2Aug 19, 2008

Hydrogen and oxygen based photoresist removal process

TEXAS INSTRUMENTS INC0 citations50
US7682989B2Mar 23, 2010

Formation of a silicon oxide interface layer during silicon carbide etch stop deposition to promote better dielectric stack adhesion

TEXAS INSTRUMENTS INC0 citations46

AIR PROD & CHEM

3 patents
US8043976B2Oct 25, 2011

Adhesion to copper and copper electromigration resistance

AIR PROD & CHEM3 citations62
US9018107B2Apr 28, 2015

Low K precursors providing superior integration attributes

AIR PROD & CHEM1 citations50
US10072237B2Sep 11, 2018

Photoresist cleaning composition used in photolithography and a method for treating substrate therewith

AIR PROD & CHEM1 citations45

MATZ LAURA M

3 patents
US8637396B2Jan 28, 2014

Dielectric barrier deposition using oxygen containing precursor

MATZ LAURA M3 citations60
US8202808B2Jun 19, 2012

Methods of forming strontium titanate films

MATZ LAURA M3 citations60
US8592058B2Nov 26, 2013

Methods of forming strontium titanate films

MATZ LAURA M0 citations49

LEI XINJIAN

1 patent
US8471049B2Jun 25, 2013

Precursors for depositing group 4 metal-containing films

LEI XINJIAN8 citations82

VERSUM MAT US LLC

1 patent
US11401441B2Aug 2, 2022

Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications

VERSUM MAT US LLC4 citations66

HAAS MARY KATHRYN

1 patent
US8753986B2Jun 17, 2014

Low k precursors providing superior integration attributes

HAAS MARY KATHRYN4 citations66

MALLIKARJUNAN ANUPAMA

1 patent
US8889235B2Nov 18, 2014

Dielectric barrier deposition using nitrogen containing precursor

MALLIKARJUNAN ANUPAMA2 citations56

IVANOV SERGEI VLADIMIROVICH

1 patent
US8507704B2Aug 13, 2013

Liquid composition containing aminoether for deposition of metal-containing films

IVANOV SERGEI VLADIMIROVICH0 citations38

WEIGEL SCOTT JEFFREY

1 patent
US8283260B2Oct 9, 2012

Process for restoring dielectric properties

WEIGEL SCOTT JEFFREY0 citations32