P

Inventor

KRAUS GEORG

DE24 patents
⚠️ This page may combine multiple inventors who share the name “KRAUS GEORG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

15 patents
US5116462AMay 26, 1992

Method of producing micromechanical sensors for the afm/stm profilometry

IBM65 citations96
US5051379ASep 24, 1991

Method of producing micromechanical sensors for the AFM/STM profilometry and micromechanical AFM/STM sensor head

IBM71 citations96
US4918033AApr 17, 1990

PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides

IBM84 citations96
US4393127AJul 12, 1983

Structure with a silicon body having through openings

IBM113 citations94
US5162133ANov 10, 1992

Process for fabricating silicon carbide films with a predetermined stress

IBM22 citations92
US5658472AAug 19, 1997

Method for producing deep vertical structures in silicon substrates

IBM46 citations91
US4557796ADec 10, 1985

Method of dry copper etching and its implementation

IBM34 citations91
US4583145AApr 15, 1986

Apparatus comprising a lubricant-coated magnetic disc and a magnetic head, and method of making said apparatus

IBM29 citations88
US4415942ANov 15, 1983

Magnetic disk substrate of fiber-reinforced plastic

IBM18 citations81
US4386968AJun 7, 1983

Method of making semiconductor device structures by means of ion implantation under a partial pressure of oxygen

IBM26 citations80
US4461237AJul 24, 1984

Plasma reactor for etching and coating substrates

IBM20 citations78
US4969415ANov 13, 1990

PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides

IBM12 citations74
US4288716ASep 8, 1981

Ion source having improved cathode

IBM7 citations73
US4569743AFeb 11, 1986

Method and apparatus for the selective, self-aligned deposition of metal layers

IBM11 citations71
US4424102AJan 3, 1984

Reactor for reactive ion etching and etching method

IBM17 citations66

FICHTEL & SACHS AG

6 patents

MAYER TEXTILMASCHF

1 patent

MANNESMANN SACHS AG

1 patent

TENNECO GMBH

1 patent