Inventor
ASHTIANI KAIHAN A
US12 patents
Patents
12 patentsUS8043972B1Oct 25, 2011
Adsorption based material removal process
NOVELLUS SYSTEMS INC537 citations98
US7416989B1Aug 26, 2008
Adsorption based material removal process
NOVELLUS SYSTEMS INC378 citations98
US7141494B2Nov 28, 2006
Method for reducing tungsten film roughness and improving step coverage
NOVELLUS SYSTEMS INC147 citations98
US7005372B2Feb 28, 2006
Deposition of tungsten nitride
NOVELLUS SYSTEMS INC187 citations98
US6179973B1Jan 30, 2001
Apparatus and method for controlling plasma uniformity across a substrate
NOVELLUS SYSTEMS INC167 citations98
US7691749B2Apr 6, 2010
Deposition of tungsten nitride
NOVELLUS SYSTEMS INC97 citations97
US7262125B2Aug 28, 2007
Method of forming low-resistivity tungsten interconnects
NOVELLUS SYSTEMS INC91 citations97
US6497796B1Dec 24, 2002
Apparatus and method for controlling plasma uniformity across a substrate
NOVELLUS SYSTEMS INC34 citations92
US6444105B1Sep 3, 2002
Physical vapor deposition reactor including magnet to control flow of ions
NOVELLUS SYSTEMS INC22 citations92
US6541371B1Apr 1, 2003
Apparatus and method for depositing superior Ta(N)/copper thin films for barrier and seed applications in semiconductor processing
NOVELLUS SYSTEMS INC17 citations91
US6500321B1Dec 31, 2002
Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target
NOVELLUS SYSTEMS INC47 citations91
US6905959B1Jun 14, 2005
Apparatus and method for depositing superior Ta (N) copper thin films for barrier and seed applications in semiconductor processing
NOVELLUS SYSTEMS INC14 citations82