P

Inventor

LEE SI-HYEUNG

KR20 patents
⚠️ This page may combine multiple inventors who share the name “LEE SI-HYEUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

17 patents
US7221031B2May 22, 2007

Semiconductor device having sufficient process margin and method of forming same

SAMSUNG ELECTRONICS CO LTD115 citations98
US7381508B2Jun 3, 2008

Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD16 citations92
US6537727B2Mar 25, 2003

Resist composition comprising photosensitive polymer having loctone in its backbone

SAMSUNG ELECTRONICS CO LTD16 citations92
US6472120B1Oct 29, 2002

Photosensitive polymer and chemically amplified photoresist composition containing the same

SAMSUNG ELECTRONICS CO LTD16 citations92
US6284438B1Sep 4, 2001

Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD16 citations83
US6642336B1Nov 4, 2003

Photosensitive polymer

SAMSUNG ELECTRONICS CO LTD6 citations73
US9673195B2Jun 6, 2017

Semiconductor device having sufficient process margin and method of forming same

SAMSUNG ELECTRONICS CO LTD1 citations62
US7259065B2Aug 21, 2007

Method of forming trench in semiconductor device

SAMSUNG ELECTRONICS CO LTD2 citations62
US6613492B2Sep 2, 2003

Photosensitive polymer having phenyl ring and lactone group and resist composition comprising the same

SAMSUNG ELECTRONICS CO LTD3 citations62
US6596459B1Jul 22, 2003

Photosensitive polymer and resist composition containing the same

SAMSUNG ELECTRONICS CO LTD4 citations62
US6593441B2Jul 15, 2003

Photosensitive polymer and chemically amplified photoresist composition containing the same

SAMSUNG ELECTRONICS CO LTD1 citations62
US6287747B1Sep 11, 2001

Photosensitive polymer having cyclic backbone and resist composition comprising the same

SAMSUNG ELECTRONICS CO LTD4 citations62
US7241552B2Jul 10, 2007

Resist composition comprising photosensitive polymer having lactone in its backbone

SAMSUNG ELECTRONICS CO LTD0 citations52
US7045267B2May 16, 2006

Resist composition comprising photosensitive polymer having lactone in its backbone

SAMSUNG ELECTRONICS CO LTD0 citations52
US7084227B2Aug 1, 2006

Photosensitive polymer and chemically amplified photoresist composition containing the same

SAMSUNG ELECTRONICS CO LTD0 citations51
US6893793B2May 17, 2005

Photosensitive polymer and chemically amplified photoresist composition containing the same

SAMSUNG ELECTRONICS CO LTD0 citations51
US7457058B2Nov 25, 2008

Optical element holder and projection exposure apparatus having the same

SAMSUNG ELECTRONICS CO LTD1 citations50

BAE YONG-KUG

1 patent

RYOO MAN-HYOUNG

1 patent

KANG CHANG-JIN

1 patent