Inventor
HOENK MICHAEL E
US22 patents
⚠️ This page may combine multiple inventors who share the name “HOENK MICHAEL E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CALIFORNIA INST OF TECHN
10 patentsUS6756795B2Jun 29, 2004
Carbon nanobimorph actuator and sensor
CALIFORNIA INST OF TECHN132 citations97
US6803840B2Oct 12, 2004
Pattern-aligned carbon nanotube growth and tunable resonator apparatus
CALIFORNIA INST OF TECHN435 citations96
US6737939B2May 18, 2004
Carbon nanotube array RF filter
CALIFORNIA INST OF TECHN144 citations96
US6685810B2Feb 3, 2004
Development of a gel-free molecular sieve based on self-assembled nano-arrays
CALIFORNIA INST OF TECHN105 citations96
US5376810ADec 27, 1994
Growth of delta-doped layers on silicon CCD/S for enhanced ultraviolet response
CALIFORNIA INST OF TECHN112 citations94
US6403963B1Jun 11, 2002
Delta-doped CCD's as low-energy particle detectors and imagers
CALIFORNIA INST OF TECHN54 citations92
US7175762B1Feb 13, 2007
Nanocarpets for trapping particulates, bacteria and spores
CALIFORNIA INST OF TECHN18 citations83
US5316586AMay 31, 1994
Silicon sample holder for molecular beam epitaxy on pre-fabricated integrated circuits
CALIFORNIA INST OF TECHN8 citations72
US10541266B2Jan 21, 2020
Atomically precise surface engineering for producing imagers
CALIFORNIA INST OF TECHN1 citations62
US10078142B2Sep 18, 2018
Sensor integrated metal dielectric filters for solar-blind silicon ultraviolet detectors
CALIFORNIA INST OF TECHN1 citations49
HOENK MICHAEL E
5 patentsUS9123622B2Sep 1, 2015
Atomic layer deposition of high performance anti reflection coatings on delta-doped CCDs
HOENK MICHAEL E8 citations83
US8680637B2Mar 25, 2014
Atomic layer deposition of chemical passivation layers and high performance anti-reflection coatings on back-illuminated detectors
HOENK MICHAEL E5 citations72
US8395243B2Mar 12, 2013
Surface passivation by quantum exclusion using multiple layers
HOENK MICHAEL E6 citations72
US8828852B2Sep 9, 2014
Delta-doping at wafer level for high throughput, high yield fabrication of silicon imaging arrays
HOENK MICHAEL E5 citations67
US9024344B2May 5, 2015
Surface passivation by quantum exclusion using multiple layers
HOENK MICHAEL E2 citations62