Inventor
SASAMOTO KOUHEI
JP23 patents
Patents
23 patentsUS9366951B2Jun 14, 2016
Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method
SHINETSU CHEMICAL CO8 citations84
US10466583B2Nov 5, 2019
Halftone phase shift mask blank and halftone phase shift mask
SHINETSU CHEMICAL CO2 citations73
US11971653B2Apr 30, 2024
Photomask blank, method for producing photomask, and photomask
SHINETSU CHEMICAL CO3 citations72
US9268212B2Feb 23, 2016
Photomask blank and method for manufacturing photomask
SHINETSU CHEMICAL CO3 citations72
US9158192B2Oct 13, 2015
Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask
SHINETSU CHEMICAL CO4 citations72
US10989999B2Apr 27, 2021
Halftone phase shift mask blank and halftone phase shift mask
SHINETSU CHEMICAL CO0 citations62
US10372030B2Aug 6, 2019
Halftone phase shift mask blank and halftone phase shift mask
SHINETSU CHEMICAL CO1 citations62
US9440375B2Sep 13, 2016
Blank for mold production and method for manufacturing mold
SHINETSU CHEMICAL CO2 citations62
US9188852B2Nov 17, 2015
Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift mask
SHINETSU CHEMICAL CO3 citations62
US10782608B2Sep 22, 2020
Method for preparing photomask blank, photomask blank, method for preparing photomask, photomask, and metallic chromium target
SHINETSU CHEMICAL CO1 citations60
US11774845B2Oct 3, 2023
Photomask blank, and manufacturing method thereof
SHINETSU CHEMICAL CO0 citations52
US11143949B2Oct 12, 2021
Photomask blank, method of manufacturing photomask, and photomask
SHINETSU CHEMICAL CO0 citations52
US9541823B2Jan 10, 2017
Photomask blank
SHINETSU CHEMICAL CO0 citations52
US12288688B2Apr 29, 2025
Manufacturing method of photomask, and photomask blank
SHINETSU CHEMICAL CO0 citations51
US10040220B2Aug 7, 2018
Blank for mold production and method for manufacturing mold
SHINETSU CHEMICAL CO0 citations51
US9851633B2Dec 26, 2017
Inorganic material film, photomask blank, and method for manufacturing photomask
SHINETSU CHEMICAL CO0 citations51
US9798229B2Oct 24, 2017
Designing of photomask blank and photomask blank
SHINETSU CHEMICAL CO0 citations51
US11131920B2Sep 28, 2021
Photomask blank, and method of manufacturing photomask
SHINETSU CHEMICAL CO0 citations50
US9880459B2Jan 30, 2018
Photomask blank and method for preparing photomask
SHINETSU CHEMICAL CO0 citations41
US9864266B2Jan 9, 2018
Photomask blank
SHINETSU CHEMICAL CO0 citations41
US9864269B2Jan 9, 2018
Photomask blank
SHINETSU CHEMICAL CO0 citations41
US10788747B2Sep 29, 2020
Photomask blank and method for producing photomask
SHINETSU CHEMICAL CO0 citations40
US9798230B2Oct 24, 2017
Photomask blank
SHINETSU CHEMICAL CO0 citations40