Inventor
BERGNER WOLFGANG
AT45 patents
⚠️ This page may combine multiple inventors who share the name “BERGNER WOLFGANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
35 patentsUS9837527B2Dec 5, 2017
Semiconductor device with a trench electrode
INFINEON TECHNOLOGIES AG22 citations94
US9478655B2Oct 25, 2016
Semiconductor device having a lower diode region arranged below a trench
INFINEON TECHNOLOGIES AG28 citations94
US9577073B2Feb 21, 2017
Method of forming a silicon-carbide device with a shielded gate
INFINEON TECHNOLOGIES AG19 citations92
US6593612B2Jul 15, 2003
Structure and method for forming a body contact for vertical transistor cells
INFINEON TECHNOLOGIES AG37 citations92
US10700192B2Jun 30, 2020
Semiconductor device having a source electrode contact trench
INFINEON TECHNOLOGIES AG7 citations84
US10038087B2Jul 31, 2018
Semiconductor device and transistor cell having a diode region
INFINEON TECHNOLOGIES AG4 citations84
US10211306B2Feb 19, 2019
Semiconductor device with diode region and trench gate structure
INFINEON TECHNOLOGIES AG15 citations83
US7301192B2Nov 27, 2007
Dram cell pair and dram memory cell array
INFINEON TECHNOLOGIES AG11 citations83
US10586845B1Mar 10, 2020
SiC trench transistor device and methods of manufacturing thereof
INFINEON TECHNOLOGIES AG9 citations82
US11043560B2Jun 22, 2021
Silicon carbide semiconductor component comprising trench gate structures and shielding regions
INFINEON TECHNOLOGIES AG1 citations73
US10818749B2Oct 27, 2020
Semiconductor devices and a circuit for controlling a field effect transistor of a semiconductor device
INFINEON TECHNOLOGIES AG6 citations73
US10727330B2Jul 28, 2020
Semiconductor device with diode region
INFINEON TECHNOLOGIES AG2 citations73
US9960243B2May 1, 2018
Semiconductor device with stripe-shaped trench gate structures and gate connector structure
INFINEON TECHNOLOGIES AG3 citations73
US9876103B2Jan 23, 2018
Semiconductor device and transistor cell having a diode region
INFINEON TECHNOLOGIES AG2 citations73
US11063142B2Jul 13, 2021
Semiconductor device including silicon carbide body and method of manufacturing
INFINEON TECHNOLOGIES AG2 citations72
US10700182B2Jun 30, 2020
Semiconductor device with transistor cells and a drift structure and method of manufacturing
INFINEON TECHNOLOGIES AG2 citations72
US6927172B2Aug 9, 2005
Process to suppress lithography at a wafer edge
INFINEON TECHNOLOGIES AG10 citations71
US10217636B2Feb 26, 2019
Method of manufacturing a silicon carbide semiconductor device by removing amorphized portions
INFINEON TECHNOLOGIES AG2 citations69
US11855147B2Dec 26, 2023
Method for producing a silicon carbide semiconductor component
INFINEON TECHNOLOGIES AG0 citations63
US11133378B2Sep 28, 2021
Semiconductor device including trench contact structure and manufacturing method
INFINEON TECHNOLOGIES AG0 citations63
US10886370B2Jan 5, 2021
Semiconductor device including silicon carbide body and method of manufacturing
INFINEON TECHNOLOGIES AG2 citations63
US9530850B2Dec 27, 2016
Semiconductor device with stripe-shaped trench gate structures and gate connector structure
INFINEON TECHNOLOGIES AG2 citations63
US11626477B2Apr 11, 2023
Silicon carbide field-effect transistor including shielding areas
INFINEON TECHNOLOGIES AG0 citations62
US11101343B2Aug 24, 2021
Silicon carbide field-effect transistor including shielding areas
INFINEON TECHNOLOGIES AG0 citations62
US9257511B2Feb 9, 2016
Silicon carbide device and a method for forming a silicon carbide device
INFINEON TECHNOLOGIES AG2 citations62
US11462611B2Oct 4, 2022
SiC device with channel regions extending along at least one of the (1-100) plane and the (-1100) plane and methods of manufacturing thereof
INFINEON TECHNOLOGIES AG0 citations61
US10896952B2Jan 19, 2021
SiC device and methods of manufacturing thereof
INFINEON TECHNOLOGIES AG0 citations61
US12324203B2Jun 3, 2025
Method for producing a silicon carbide semiconductor component
INFINEON TECHNOLOGIES AG0 citations59
US11842938B2Dec 12, 2023
Semiconductor device and method for forming a semiconductor device
INFINEON TECHNOLOGIES AG0 citations59
US11217500B2Jan 4, 2022
Semiconductor device and method for forming a semiconductor device
INFINEON TECHNOLOGIES AG0 citations59
US11417747B2Aug 16, 2022
Transistor device with a varying gate runner resistivity per area
INFINEON TECHNOLOGIES AG0 citations52
US9960230B2May 1, 2018
Silicon-carbide transistor device with a shielded gate
INFINEON TECHNOLOGIES AG1 citations52
US11282926B2Mar 22, 2022
Semiconductor device with a semiconductor body of silicon carbide
INFINEON TECHNOLOGIES AG0 citations51
US9496346B2Nov 15, 2016
Silicon carbide device and a method for forming a silicon carbide device
INFINEON TECHNOLOGIES AG0 citations51
US9934972B2Apr 3, 2018
Method of manufacturing a silicon carbide semiconductor device by removing amorphized portions
INFINEON TECHNOLOGIES AG0 citations48
IBM
5 patentsUS6509624B1Jan 21, 2003
Semiconductor fuses and antifuses in vertical DRAMS
IBM37 citations92
US6686668B2Feb 3, 2004
Structure and method of forming bitline contacts for a vertical DRAM array using a line bitline contact mask
IBM8 citations74
US6667504B1Dec 23, 2003
Self-aligned buried strap process using doped HDP oxide
IBM11 citations74
US6946345B2Sep 20, 2005
Self-aligned buried strap process using doped HDP oxide
IBM5 citations63
US6767781B2Jul 27, 2004
Structure and method of forming bitline contacts for a vertical DRAM array using a line bitline contact mask
IBM0 citations50
SIEMENS AG
4 patentsUS6080618AJun 27, 2000
Controllability of a buried device layer
SIEMENS AG37 citations93
US5935873AAug 10, 1999
Deposition of carbon into nitride layer for improved selectivity of oxide to nitride etchrate for self aligned contact etching
SIEMENS AG21 citations92
US6699794B1Mar 2, 2004
Self aligned buried plate
SIEMENS AG17 citations83
US5976982ANov 2, 1999
Methods for protecting device components from chemical mechanical polish induced defects
SIEMENS AG12 citations71