Inventor
SHEN HONGLIANG
US23 patents
⚠️ This page may combine multiple inventors who share the name “SHEN HONGLIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GLOBALFOUNDRIES INC
20 patentsUS9653583B1May 16, 2017
Methods of forming diffusion breaks on integrated circuit products comprised of finFET devices
GLOBALFOUNDRIES INC79 citations98
US9368496B1Jun 14, 2016
Method for uniform recess depth and fill in single diffusion break for fin-type process and resulting devices
GLOBALFOUNDRIES INC77 citations98
US9171752B1Oct 27, 2015
Product comprised of FinFET devices with single diffusion break isolation structures, and methods of making such a product
GLOBALFOUNDRIES INC83 citations97
US9455198B1Sep 27, 2016
Methods of removing fins so as to form isolation structures on products that include FinFET semiconductor devices
GLOBALFOUNDRIES INC51 citations94
US9406676B2Aug 2, 2016
Method for forming single diffusion breaks between finFET devices and the resulting devices
GLOBALFOUNDRIES INC41 citations94
US9263516B1Feb 16, 2016
Product comprised of FinFET devices with single diffusion break isolation structures
GLOBALFOUNDRIES INC22 citations92
US9087870B2Jul 21, 2015
Integrated circuits including FINFET devices with shallow trench isolation that includes a thermal oxide layer and methods for making the same
GLOBALFOUNDRIES INC18 citations92
US9123773B1Sep 1, 2015
T-shaped single diffusion barrier with single mask approach process flow
GLOBALFOUNDRIES INC34 citations91
US9373535B2Jun 21, 2016
T-shaped fin isolation region and methods of fabrication
GLOBALFOUNDRIES INC7 citations84
US10423078B1Sep 24, 2019
FinFET cut isolation opening revision to compensate for overlay inaccuracy
GLOBALFOUNDRIES INC6 citations82
US9123771B2Sep 1, 2015
Shallow trench isolation integration methods and devices formed thereby
GLOBALFOUNDRIES INC13 citations82
US10580857B2Mar 3, 2020
Method to form high performance fin profile for 12LP and above
GLOBALFOUNDRIES INC3 citations72
US9219002B2Dec 22, 2015
Overlay performance for a fin field effect transistor device
GLOBALFOUNDRIES INC6 citations72
US10324381B1Jun 18, 2019
FinFET cut isolation opening revision to compensate for overlay inaccuracy
GLOBALFOUNDRIES INC2 citations71
US9385192B2Jul 5, 2016
Shallow trench isolation integration methods and devices formed thereby
GLOBALFOUNDRIES INC3 citations71
US9362176B2Jun 7, 2016
Uniform exposed raised structures for non-planar semiconductor devices
GLOBALFOUNDRIES INC2 citations63
US8969205B2Mar 3, 2015
Double patterning via triangular shaped sidewall spacers
GLOBALFOUNDRIES INC2 citations62
US9159667B2Oct 13, 2015
Methods of forming an e-fuse for an integrated circuit product and the resulting e-fuse structure
GLOBALFOUNDRIES INC2 citations57
US10910276B1Feb 2, 2021
STI structure with liner along lower portion of longitudinal sides of active region, and related FET and method
GLOBALFOUNDRIES INC0 citations51
US10804170B2Oct 13, 2020
Device/health of line (HOL) aware eBeam based overlay (EBO OVL) structure
GLOBALFOUNDRIES INC0 citations51
GLOBALFOUNDRIES US INC
2 patentsUS10957701B1Mar 23, 2021
Fin-based anti-fuse device for integrated circuit (IC) products, methods of making such an anti-fuse device and IC products comprising such an anti-fuse device
GLOBALFOUNDRIES US INC4 citations71
US11037937B2Jun 15, 2021
SRAM bit cells formed with dummy structures
GLOBALFOUNDRIES US INC2 citations69