Inventor
BRISTOL ROBERT
US26 patents
⚠️ This page may combine multiple inventors who share the name “BRISTOL ROBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
24 patentsUS7230258B2Jun 12, 2007
Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
INTEL CORP54 citations94
US7153615B2Dec 26, 2006
Extreme ultraviolet pellicle using a thin film and supportive mesh
INTEL CORP27 citations92
US7078700B2Jul 18, 2006
Optics for extreme ultraviolet lithography
INTEL CORP22 citations92
US6968850B2Nov 29, 2005
In-situ cleaning of light source collector optics
INTEL CORP30 citations92
US6963071B2Nov 8, 2005
Debris mitigation device
INTEL CORP26 citations92
US6809327B2Oct 26, 2004
EUV source box
INTEL CORP22 citations92
US7374867B2May 20, 2008
Enhancing photoresist performance using electric fields
INTEL CORP21 citations90
US6825988B2Nov 30, 2004
Etched silicon diffraction gratings for use as EUV spectral purity filters
INTEL CORP15 citations84
US7423275B2Sep 9, 2008
Erosion mitigation for collector optics using electric and magnetic fields
INTEL CORP13 citations83
US7413586B2Aug 19, 2008
In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles
INTEL CORP10 citations83
US7652272B2Jan 26, 2010
Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
INTEL CORP11 citations82
US7195021B2Mar 27, 2007
In-situ cleaning of light source collector optics
INTEL CORP5 citations74
US12165987B2Dec 10, 2024
Frame reveals with maskless lithography in the manufacture of integrated circuits
INTEL CORP0 citations62
US12107044B2Oct 1, 2024
Metal oxycarbide resists as leave behind plugs
INTEL CORP0 citations62
US7355190B2Apr 8, 2008
Debris mitigation device
INTEL CORP3 citations62
US7527920B2May 5, 2009
Active hardmask for lithographic patterning
INTEL CORP2 citations61
US7446329B2Nov 4, 2008
Erosion resistance of EUV source electrodes
INTEL CORP5 citations61
US7041993B2May 9, 2006
Protective coatings for radiation source components
INTEL CORP2 citations61
US7033739B2Apr 25, 2006
Active hardmask for lithographic patterning
INTEL CORP3 citations61
US6809328B2Oct 26, 2004
Protective coatings for radiation source components
INTEL CORP3 citations61
US12037434B2Jul 16, 2024
Chemical compositions and methods of patterning microelectronic device structures
INTEL CORP0 citations60
US11846883B2Dec 19, 2023
Chain scission photoresists and methods for forming chain scission photoresists
INTEL CORP0 citations60
US11300885B2Apr 12, 2022
EUV phase-shift SRAF masks by means of embedded phase shift layers
INTEL CORP0 citations58
US7567379B2Jul 28, 2009
Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system
INTEL CORP0 citations51