Inventor
ZHANG GUOJING
US12 patents
Patents
12 patentsUS5928817AJul 27, 1999
Method of protecting an EUV mask from damage and contamination
INTEL CORP63 citations95
US6908714B2Jun 21, 2005
Absorber layer for EUV
INTEL CORP17 citations92
US6610447B2Aug 26, 2003
Extreme ultraviolet mask with improved absorber
INTEL CORP31 citations92
US6720118B2Apr 13, 2004
Enhanced inspection of extreme ultraviolet mask
INTEL CORP29 citations91
US6583068B2Jun 24, 2003
Enhanced inspection of extreme ultraviolet mask
INTEL CORP23 citations91
US6905801B2Jun 14, 2005
High performance EUV mask
INTEL CORP20 citations90
US5958629ASep 28, 1999
Using thin films as etch stop in EUV mask fabrication process
INTEL CORP46 citations89
US11194246B1Dec 7, 2021
Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits
INTEL CORP4 citations69
US12209975B2Jan 28, 2025
Real-time detection of deflections and ruptures of EUV pellicle membranes
INTEL CORP2 citations65
US11604406B2Mar 14, 2023
Method and apparatus for fabrication of very large scale integration pattern features via electroless deposition on extreme ultraviolet lithography photomasks
INTEL CORP0 citations60
US11561466B2Jan 24, 2023
Monolithically framed pellicle membrane suitable for lithography in the fabrication of integrated circuits
INTEL CORP0 citations58
US11300885B2Apr 12, 2022
EUV phase-shift SRAF masks by means of embedded phase shift layers
INTEL CORP0 citations58