P

Inventor

VENTZEK PETER LOWELL GEORGE

US21 patents
⚠️ This page may combine multiple inventors who share the name “VENTZEK PETER LOWELL GEORGE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

20 patents
US12394600B2Aug 19, 2025

Balanced RF resonant antenna system

TOKYO ELECTRON LTD2 citations73
US12183583B2Dec 31, 2024

Remote source pulsing with advanced pulse control

TOKYO ELECTRON LTD2 citations72
US12580153B2Mar 17, 2026

Balanced resonator source for plasma processing

TOKYO ELECTRON LTD0 citations62
US12500067B2Dec 16, 2025

Apparatus for edge control during plasma processing

TOKYO ELECTRON LTD0 citations62
US12400865B2Aug 26, 2025

Pulsed capacitively coupled plasma processes

TOKYO ELECTRON LTD0 citations62
US12176204B2Dec 24, 2024

Cyclic low temperature film growth processes

TOKYO ELECTRON LTD0 citations62
US11773484B2Oct 3, 2023

Hard mask deposition using direct current superimposed radio frequency plasma

TOKYO ELECTRON LTD0 citations62
US12387910B2Aug 12, 2025

Plasma processing with broadband RF waveforms

TOKYO ELECTRON LTD0 citations60
US12300468B2May 13, 2025

Method of uniformity control

TOKYO ELECTRON LTD0 citations60
US12020902B2Jun 25, 2024

Plasma processing with broadband RF waveforms

TOKYO ELECTRON LTD0 citations60
US12217935B2Feb 4, 2025

Plasma processing methods using multiphase multifrequency bias pulses

TOKYO ELECTRON LTD0 citations59
US12555756B2Feb 17, 2026

System and method to measure ion properties in a plasma system

TOKYO ELECTRON LTD0 citations58
US11557487B2Jan 17, 2023

Etching metal during processing of a semiconductor structure

TOKYO ELECTRON LTD1 citations56
US12531205B2Jan 20, 2026

Equipment and method for improved edge uniformity of plasma processing of wafers

TOKYO ELECTRON LTD0 citations51
US12487182B2Dec 2, 2025

Non-intrusive method for 2D/3D mapping plasma parameters

TOKYO ELECTRON LTD0 citations51
US12451329B2Oct 21, 2025

Plasma processing apparatus with tunable electrical characteristic

TOKYO ELECTRON LTD0 citations51
US12412748B2Sep 9, 2025

Plasma processing with magnetic ring X point

TOKYO ELECTRON LTD0 citations51
US12387919B2Aug 12, 2025

ALD process with plasma treatment

TOKYO ELECTRON LTD0 citations51
US11942307B2Mar 26, 2024

Plasma processing with radio frequency (RF) source and bias signal waveforms

TOKYO ELECTRON LTD0 citations51
US12224160B2Feb 11, 2025

Topographic selective deposition

TOKYO ELECTRON LTD0 citations50

MOTOROLA INC

1 patent