Inventor
VENTZEK PETER LOWELL GEORGE
US21 patents
⚠️ This page may combine multiple inventors who share the name “VENTZEK PETER LOWELL GEORGE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
20 patentsUS12394600B2Aug 19, 2025
Balanced RF resonant antenna system
TOKYO ELECTRON LTD2 citations73
US12183583B2Dec 31, 2024
Remote source pulsing with advanced pulse control
TOKYO ELECTRON LTD2 citations72
US12580153B2Mar 17, 2026
Balanced resonator source for plasma processing
TOKYO ELECTRON LTD0 citations62
US12500067B2Dec 16, 2025
Apparatus for edge control during plasma processing
TOKYO ELECTRON LTD0 citations62
US12400865B2Aug 26, 2025
Pulsed capacitively coupled plasma processes
TOKYO ELECTRON LTD0 citations62
US12176204B2Dec 24, 2024
Cyclic low temperature film growth processes
TOKYO ELECTRON LTD0 citations62
US11773484B2Oct 3, 2023
Hard mask deposition using direct current superimposed radio frequency plasma
TOKYO ELECTRON LTD0 citations62
US12387910B2Aug 12, 2025
Plasma processing with broadband RF waveforms
TOKYO ELECTRON LTD0 citations60
US12300468B2May 13, 2025
Method of uniformity control
TOKYO ELECTRON LTD0 citations60
US12020902B2Jun 25, 2024
Plasma processing with broadband RF waveforms
TOKYO ELECTRON LTD0 citations60
US12217935B2Feb 4, 2025
Plasma processing methods using multiphase multifrequency bias pulses
TOKYO ELECTRON LTD0 citations59
US12555756B2Feb 17, 2026
System and method to measure ion properties in a plasma system
TOKYO ELECTRON LTD0 citations58
US11557487B2Jan 17, 2023
Etching metal during processing of a semiconductor structure
TOKYO ELECTRON LTD1 citations56
US12531205B2Jan 20, 2026
Equipment and method for improved edge uniformity of plasma processing of wafers
TOKYO ELECTRON LTD0 citations51
US12487182B2Dec 2, 2025
Non-intrusive method for 2D/3D mapping plasma parameters
TOKYO ELECTRON LTD0 citations51
US12451329B2Oct 21, 2025
Plasma processing apparatus with tunable electrical characteristic
TOKYO ELECTRON LTD0 citations51
US12412748B2Sep 9, 2025
Plasma processing with magnetic ring X point
TOKYO ELECTRON LTD0 citations51
US12387919B2Aug 12, 2025
ALD process with plasma treatment
TOKYO ELECTRON LTD0 citations51
US11942307B2Mar 26, 2024
Plasma processing with radio frequency (RF) source and bias signal waveforms
TOKYO ELECTRON LTD0 citations51
US12224160B2Feb 11, 2025
Topographic selective deposition
TOKYO ELECTRON LTD0 citations50