Inventor
OHATA MITSUNORI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “OHATA MITSUNORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
29 patentsUS10217933B2Feb 26, 2019
Method for etching multilayer film
TOKYO ELECTRON LTD40 citations94
US7893387B2Feb 22, 2011
High rate method for stable temperature control of a substrate
TOKYO ELECTRON LTD26 citations92
US7557328B2Jul 7, 2009
High rate method for stable temperature control of a substrate
TOKYO ELECTRON LTD17 citations92
US11798787B2Oct 24, 2023
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD4 citations74
US12394600B2Aug 19, 2025
Balanced RF resonant antenna system
TOKYO ELECTRON LTD2 citations73
US11251021B2Feb 15, 2022
Mode-switching plasma systems and methods of operating thereof
TOKYO ELECTRON LTD2 citations73
US12183583B2Dec 31, 2024
Remote source pulsing with advanced pulse control
TOKYO ELECTRON LTD2 citations72
US12580153B2Mar 17, 2026
Balanced resonator source for plasma processing
TOKYO ELECTRON LTD0 citations62
US12394629B2Aug 19, 2025
Plasma processing methods using low frequency bias pulses
TOKYO ELECTRON LTD0 citations62
US12230475B2Feb 18, 2025
Systems and methods of control for plasma processing
TOKYO ELECTRON LTD0 citations62
US12154761B2Nov 26, 2024
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations62
US11915910B2Feb 27, 2024
Fast neutral generation for plasma processing
TOKYO ELECTRON LTD0 citations62
US11450515B2Sep 20, 2022
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11158516B2Oct 26, 2021
Plasma processing methods using low frequency bias pulses
TOKYO ELECTRON LTD0 citations62
US10910196B1Feb 2, 2021
Mode-switching plasma systems and methods of operating thereof
TOKYO ELECTRON LTD0 citations62
US12374531B2Jul 29, 2025
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations60
US12300468B2May 13, 2025
Method of uniformity control
TOKYO ELECTRON LTD0 citations60
US11817295B2Nov 14, 2023
Three-phase pulsing systems and methods for plasma processing
TOKYO ELECTRON LTD0 citations52
US11521834B2Dec 6, 2022
Plasma processing systems and methods for chemical processing a substrate
TOKYO ELECTRON LTD0 citations52
US10825663B2Nov 3, 2020
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations52
US12451329B2Oct 21, 2025
Plasma processing apparatus with tunable electrical characteristic
TOKYO ELECTRON LTD0 citations51
US12347646B2Jul 1, 2025
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations51
US10020172B2Jul 10, 2018
Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method
TOKYO ELECTRON LTD1 citations51
US12347654B2Jul 1, 2025
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations49
US12334313B2Jun 17, 2025
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations44
US11972925B2Apr 30, 2024
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations41
US10685816B2Jun 16, 2020
Method of etching object to be processed
TOKYO ELECTRON LTD0 citations41
US10541142B2Jan 21, 2020
Maintenance method of plasma processing apparatus
TOKYO ELECTRON LTD0 citations41
US10204766B2Feb 12, 2019
Ion beam irradiation apparatus and substrate processing apparatus
TOKYO ELECTRON LTD0 citations36