Inventor
MENK GREGORY E
US31 patents
⚠️ This page may combine multiple inventors who share the name “MENK GREGORY E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
21 patentsUS9873180B2Jan 23, 2018
CMP pad construction with composite material properties using additive manufacturing processes
APPLIED MATERIALS INC41 citations97
US10537974B2Jan 21, 2020
CMP pad construction with composite material properties using additive manufacturing processes
APPLIED MATERIALS INC17 citations94
US10493691B2Dec 3, 2019
Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
APPLIED MATERIALS INC16 citations94
US9776361B2Oct 3, 2017
Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
APPLIED MATERIALS INC21 citations94
US10593574B2Mar 17, 2020
Techniques for combining CMP process tracking data with 3D printed CMP consumables
APPLIED MATERIALS INC19 citations93
US10384330B2Aug 20, 2019
Polishing pads produced by an additive manufacturing process
APPLIED MATERIALS INC22 citations93
US7553214B2Jun 30, 2009
Polishing article with integrated window stripe
APPLIED MATERIALS INC23 citations91
US7063597B2Jun 20, 2006
Polishing processes for shallow trench isolation substrates
APPLIED MATERIALS INC30 citations88
US10875145B2Dec 29, 2020
Polishing pads produced by an additive manufacturing process
APPLIED MATERIALS INC17 citations85
US10821573B2Nov 3, 2020
Polishing pads produced by an additive manufacturing process
APPLIED MATERIALS INC17 citations85
US10322491B2Jun 18, 2019
Printed chemical mechanical polishing pad
APPLIED MATERIALS INC17 citations85
US8033895B2Oct 11, 2011
Retaining ring with shaped profile
APPLIED MATERIALS INC7 citations84
US7601050B2Oct 13, 2009
Polishing apparatus with grooved subpad
APPLIED MATERIALS INC11 citations82
US11724362B2Aug 15, 2023
Polishing pads produced by an additive manufacturing process
APPLIED MATERIALS INC5 citations73
US7179159B2Feb 20, 2007
Materials for chemical mechanical polishing
APPLIED MATERIALS INC8 citations71
US12023853B2Jul 2, 2024
Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
APPLIED MATERIALS INC0 citations62
US11958162B2Apr 16, 2024
CMP pad construction with composite material properties using additive manufacturing processes
APPLIED MATERIALS INC0 citations62
US11986922B2May 21, 2024
Techniques for combining CMP process tracking data with 3D printed CMP consumables
APPLIED MATERIALS INC0 citations61
US7841925B2Nov 30, 2010
Polishing article with integrated window stripe
APPLIED MATERIALS INC3 citations61
US7429210B2Sep 30, 2008
Materials for chemical mechanical polishing
APPLIED MATERIALS INC3 citations60
US10786885B2Sep 29, 2020
Thin plastic polishing article for CMP applications
APPLIED MATERIALS INC0 citations38
ITT
4 patentsUS4994868AFeb 19, 1991
Heterojunction confined channel FET
ITT9 citations73
US4962050AOct 9, 1990
GaAs FET manufacturing process employing channel confining layers
ITT13 citations73
US4948752AAug 14, 1990
Method of making sagfets on buffer layers
ITT7 citations73
US4918493AApr 17, 1990
Sagfet with buffer layers
ITT5 citations62
DHANDAPANI SIVAKUMAR
3 patentsUS9138860B2Sep 22, 2015
Closed-loop control for improved polishing pad profiles
DHANDAPANI SIVAKUMAR23 citations90
US8337279B2Dec 25, 2012
Closed-loop control for effective pad conditioning
DHANDAPANI SIVAKUMAR4 citations60
US8758085B2Jun 24, 2014
Method for compensation of variability in chemical mechanical polishing consumables
DHANDAPANI SIVAKUMAR3 citations59