Inventor

HAMADA YOSHITAKA

JP44 patents

⚠️ This page may combine multiple inventors who share the name “HAMADA YOSHITAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HAMADA YOSHITAKA

SHINETSU CHEMICAL CO

Conductive powder and making process

Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device

Organosiloxane compound with one end stopped with an aminoalkyl group and a manufacturing method thereof

Process for preparing a dispersion liquid of zeolite fine particles

Positive resist material and pattern formation method using the same

Sacrificial film-forming composition, patterning process, sacrificial film and removal method

Porous film-forming composition, patterning process, and porous sacrificial film

Conductive powder and making process

Purification of organic silicon polymer

Conductive circuit board and method for making

Organopolysiloxane compound having liquid-crystalline phase

Conductive polymers and process for preparing the same

Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device

Resist composition and patterning process using the same

Sacrificial film-forming composition, patterning process, sacrificial film and removal method

Silsesquioxane compound mixture, method of making, resist composition, and patterning process

Polysilane copolymers and method for preparing same

Formation of conductive circuit, conductive circuit, and conductive ink composition

Method for forming insulating film with low dielectric constant

Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process

Resist composition and patterning process

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film

Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

HAMADA YOSHITAKA

High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device

Preparation process of trisilylamine

Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film

SIP telephone set, and file transfer system, file transfer method and file transfer program thereof

Silicone resin composition and optical material

MIPS CO LTD

Integrated circuit card and connector arrangement using same

Integrated circuit card with increased number of connecting terminals

Integrated circuit card having memory errasable with ultraviolet ray

IBM

Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same

HITACHI INT ELECTRIC INC

Semiconductor device producing method and substrate processing apparatus

MITA KOZO

Packaging bag

YAGIHASHI FUJIO

Substrate joining method and 3-D semiconductor device

HEAT SYSTEM RESEARCH & INDUSTR

Water soluble pyrolytic paint

NAKASHIMA MUTSUO

Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing