Inventor
TERASAKI MASATO
JP24 patents
⚠️ This page may combine multiple inventors who share the name “TERASAKI MASATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
17 patentsUSD739832SSep 29, 2015
Reaction tube
HITACHI INT ELECTRIC INC34 citations94
USD725055SMar 24, 2015
Reaction tube
HITACHI INT ELECTRIC INC36 citations94
USD719114SDec 9, 2014
Reaction tube
HITACHI INT ELECTRIC INC19 citations92
USD711843SAug 26, 2014
Reaction tube
HITACHI INT ELECTRIC INC30 citations92
USD773609SDec 6, 2016
Return nozzle
HITACHI INT ELECTRIC INC10 citations84
USD771772SNov 15, 2016
Return nozzle
HITACHI INT ELECTRIC INC8 citations84
USD720707SJan 6, 2015
Reaction tube
HITACHI INT ELECTRIC INC14 citations84
US7795157B2Sep 14, 2010
Substrate treatment device and manufacturing method of semiconductor device
HITACHI INT ELECTRIC INC9 citations82
US11462401B2Oct 4, 2022
Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC2 citations73
US9401272B2Jul 26, 2016
Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC3 citations73
US10607833B2Mar 31, 2020
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC2 citations72
US10513775B2Dec 24, 2019
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC4 citations72
US10081868B2Sep 25, 2018
Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC6 citations72
USD771543SNov 15, 2016
Return nozzle
HITACHI INT ELECTRIC INC2 citations63
US10513774B2Dec 24, 2019
Substrate processing apparatus and guide portion
HITACHI INT ELECTRIC INC1 citations62
US9905413B2Feb 27, 2018
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations51
US9934960B2Apr 3, 2018
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations50
KOKUSAI ELECTRIC CORP
4 patentsUS10840094B2Nov 17, 2020
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP4 citations71
US11972934B2Apr 30, 2024
Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US10714336B2Jul 14, 2020
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations51
US12148611B2Nov 19, 2024
Substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations50