Inventor

MALLIKARJUNAN ANUPAMA

US20 patents

⚠️ This page may combine multiple inventors who share the name “MALLIKARJUNAN ANUPAMA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MALLIKARJUNAN ANUPAMA

VERSUM MAT US LLC

Compositions and methods using same for carbon doped silicon containing films

Compositions and methods for making silicon containing films

Compositions and methods using same for carbon doped silicon containing films

High temperature atomic layer deposition of silicon-containing films

Composition and methods using same for carbon doped silicon containing films

Silicon-based films and methods of forming the same

Methods for depositing films with organoaminodisilane precursors

Organoaminodisilane precursors and methods for depositing films comprising same

Methods for depositing films with organoaminodisilane precursors

Shared data induced quality control for a chemical mechanical planarization process

Methods for depositing a conformal metal or metalloid silicon nitride film

AIR PROD & CHEM

Methods for depositing films with organoaminodisilane precursors

Methods for depositing silicon nitride films

Barrier materials for display devices

Methods for depositing films with organoaminodisilane precursors

Silicon-based films and methods of forming the same

Organoaminodisilane precursors and methods for depositing films comprising same

IBM

Method of producing highly strained PECVD silicon nitride thin films at low temperature

WU DINGJUN

Selective etching and formation of xenon difluoride

MALLIKARJUNAN ANUPAMA

Dielectric barrier deposition using nitrogen containing precursor