P

Inventor

WANG MEILIANG

CN26 patents
⚠️ This page may combine multiple inventors who share the name “WANG MEILIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VERSUM MAT US LLC

23 patents
US10453675B2Oct 22, 2019

Organoaminosilane precursors and methods for depositing films comprising same

VERSUM MAT US LLC17 citations94
US11952465B2Apr 9, 2024

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

VERSUM MAT US LLC1 citations73
US11626279B2Apr 11, 2023

Compositions and methods for making silicon containing films

VERSUM MAT US LLC2 citations73
US11139162B2Oct 5, 2021

Organoaminosilane precursors and methods for depositing films comprising same

VERSUM MAT US LLC2 citations73
US11098069B2Aug 24, 2021

Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

VERSUM MAT US LLC2 citations73
US11078569B2Aug 3, 2021

Trisilylamine derivatives as precursors for high growth rate silicon-containing films

VERSUM MAT US LLC2 citations73
US10822458B2Nov 3, 2020

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

VERSUM MAT US LLC2 citations73
US10283348B2May 7, 2019

High temperature atomic layer deposition of silicon-containing films

VERSUM MAT US LLC2 citations73
US10464953B2Nov 5, 2019

Carbon bridged aminosilane compounds for high growth rate silicon-containing films

VERSUM MAT US LLC2 citations71
US12297115B2May 13, 2025

High temperature atomic layer deposition of silicon-containing film

VERSUM MAT US LLC1 citations64
US12534579B2Jan 27, 2026

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

VERSUM MAT US LLC0 citations62
US12480206B2Nov 25, 2025

Organoaminodisilazanes for high temperature atomic layer deposition of silicon oxide thin films

VERSUM MAT US LLC0 citations62
US11702743B2Jul 18, 2023

Trisilylamine derivatives as precursors for high growth rate silicon-containing films

VERSUM MAT US LLC0 citations62
US10991571B2Apr 27, 2021

High temperature atomic layer deposition of silicon oxide thin films

VERSUM MAT US LLC1 citations62
US11584854B2Feb 21, 2023

Compositions and methods for the deposition of silicon oxide films

VERSUM MAT US LLC1 citations61
US10703915B2Jul 7, 2020

Compositions and methods for the deposition of silicon oxide films

VERSUM MAT US LLC1 citations61
US12421603B2Sep 23, 2025

Composition for high temperature atomic layer deposition of high quality silicon oxide thin films

VERSUM MAT US LLC0 citations52
US12018040B2Jun 25, 2024

Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

VERSUM MAT US LLC0 citations52
US11649547B2May 16, 2023

Deposition of carbon doped silicon oxide

VERSUM MAT US LLC0 citations52
US10460929B2Oct 29, 2019

Organoaminosilane precursors and methods for depositing films comprising same

VERSUM MAT US LLC0 citations52
US12435416B2Oct 7, 2025

Compositions and methods using same for non-conformal deposition of silicon containing films

VERSUM MAT US LLC0 citations51
US11591692B2Feb 28, 2023

Organoamino-polysiloxanes for deposition of silicon-containing films

VERSUM MAT US LLC0 citations51
US11713328B2Aug 1, 2023

Stable alkenyl or alkynyl-containing organosilicon precursor compositions

VERSUM MAT US LLC0 citations50

AIR PROD & CHEM

2 patents

VERSON MAT US LLC

1 patent