Inventor

LEI XINJIAN

US140 patents

⚠️ This page may combine multiple inventors who share the name “LEI XINJIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEI XINJIAN

AIR PROD & CHEM

Preparation of metal imino/amino complexes for metal oxide and metal nitride thin films

Halogenated organoaminosilane precursors and methods for depositing films comprising same

Process for producing silicon and oxide films from organoaminosilane precursors

Process for producing silicon oxide films for organoaminosilane precursors

Methods for depositing films with organoaminodisilane precursors

Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films

Methods to prepare silicon-containing films

High temperature atomic layer deposition of silicon oxide thin films

Methods of forming non-oxygen containing silicon-based films

Alkoxyaminosilane compounds and applications thereof

Metal complexes of tridentate BETA -ketoiminates

Metal complexes of tridentate β-ketoiminates

Alkyl-alkoxysilacyclic compounds

Cyclic chemical vapor deposition of metal-silicon containing films

Organometallic complexes and their use as precursors to deposit metal films

Methods for depositing silicon nitride films

Method of making a multicomponent film

Methods for depositing Group 13 metal or metalloid nitride films

Method and precursors for manufacturing 3D devices

High temperature atomic layer deposition of silicon oxide thin films

Volatile dihydropyrazinly and dihydropyrazine metal complexes

AZA-polysilane precursors and methods for depositing films comprising same

Organoaminosilanes and methods for making same

Vessel with filter

Method of making a multicomponent film

VERSUM MAT US LLC

Precursors and flowable CVD methods for making low-K films to fill surface features

Organoaminosilane precursors and methods for depositing films comprising same

Compositions and methods using same for carbon doped silicon containing films

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

Compositions and methods for making silicon containing films

Compositions and methods using same for carbon doped silicon containing films

Organoaminosilane precursors and methods for depositing films comprising same

Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

Trisilylamine derivatives as precursors for high growth rate silicon-containing films

Methods for making silicon and nitrogen containing films

Alkoxysilylamine compounds and applications thereof

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

Compositions and methods using same for deposition of silicon-containing films

Organoaminosilanes and methods for making same

High temperature atomic layer deposition of silicon-containing films

XIAO MANCHAO

Organoaminosilane precursors and methods for making and using same

Organoaminosilane precursors and methods for depositing films comprising same

Process for producing silicon and oxide films from organoaminosilane precursors

Organoaminosilane precursors and methods for making and using same

Method of making a multicomponent film

YANG LIU

Low temperature deposition of silicon-containing films

NORMAN JOHN ANTHONY THOMAS

Metal-enolate precursors for depositing metal-containing films

LEI XINJIAN

Precursors for depositing group 4 metal-containing films

STEIDL THOMAS ANDREW

Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel

THRIDANDAM HAREESH

Plasma enhanced cyclic chemical vapor deposition of silicon-containing films