Inventor
LEE HONG-JI
TW35 patents
⚠️ This page may combine multiple inventors who share the name “LEE HONG-JI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MACRONIX INT CO LTD
22 patentsUS8383512B2Feb 26, 2013
Method for making multilayer connection structure
MACRONIX INT CO LTD58 citations98
US9012282B2Apr 21, 2015
Self-aligned liner method of avoiding PL gate damage
MACRONIX INT CO LTD5 citations81
US9269660B2Feb 23, 2016
Multilayer connection structure
MACRONIX INT CO LTD3 citations73
US7435681B2Oct 14, 2008
Methods of etching stacks having metal layers and hard mask layers
MACRONIX INT CO LTD2 citations63
US7427519B2Sep 23, 2008
Method of detecting end point of plasma etching process
MACRONIX INT CO LTD3 citations63
US9425086B2Aug 23, 2016
Method of controlling contact hole profile for metal fill-in
MACRONIX INT CO LTD2 citations60
US7550390B2Jun 23, 2009
Method and apparatus for dielectric etching during integrated circuit fabrication
MACRONIX INT CO LTD2 citations60
US12484227B2Nov 25, 2025
Memory device with source line over a bonding pad
MACRONIX INT CO LTD0 citations56
US9305840B2Apr 5, 2016
Cluster system for eliminating barrier overhang
MACRONIX INT CO LTD2 citations53
US7410593B2Aug 12, 2008
Plasma etching methods using nitrogen memory species for sustaining glow discharge
MACRONIX INT CO LTD0 citations52
US9449915B2Sep 20, 2016
Semiconductor device and method of manufacturing the same
MACRONIX INT CO LTD1 citations51
US8372714B2Feb 12, 2013
Semiconductor device and method of manufacturing a semiconductor device
MACRONIX INT CO LTD0 citations51
US9337036B2May 10, 2016
Method of forming copper sulfide film for reducing copper oxidization and loss
MACRONIX INT CO LTD0 citations50
US9299667B2Mar 29, 2016
Method of shaping densely arranged PL gates and peripheral MOS gates for ILD oxide fill-in
MACRONIX INT CO LTD0 citations50
US9287285B2Mar 15, 2016
Self-aligned liner method of avoiding PL gate damage
MACRONIX INT CO LTD0 citations49
US9224803B2Dec 29, 2015
Formation of a high aspect ratio contact hole
MACRONIX INT CO LTD1 citations49
US12048154B2Jul 23, 2024
Memory device and manufacturing method thereof
MACRONIX INT CO LTD0 citations48
US10204859B2Feb 12, 2019
Interconnect structure and fabricating method thereof
MACRONIX INT CO LTD0 citations44
US9922876B1Mar 20, 2018
Interconnect structure and fabricating method thereof
MACRONIX INT CO LTD1 citations44
US10424593B2Sep 24, 2019
Three-dimensional non-volatile memory and manufacturing method thereof
MACRONIX INT CO LTD0 citations39
US9627247B2Apr 18, 2017
Semiconductor device and method of fabricating the same
MACRONIX INT CO LTD0 citations39
US9881809B2Jan 30, 2018
Semiconductor device and method of fabricating the same
MACRONIX INT CO LTD0 citations31
NANO ARCHITECT RES CORP
3 patentsUS6451161B1Sep 17, 2002
Method and apparatus for generating high-density uniform plasma
NANO ARCHITECT RES CORP103 citations92
US6319858B1Nov 20, 2001
Methods for reducing a dielectric constant of a dielectric film and for forming a low dielectric constant porous film
NANO ARCHITECT RES CORP50 citations89
US6462483B1Oct 8, 2002
Induction plasma processing chamber
NANO ARCHITECT RES CORP20 citations87