Inventor
JUNG DONG-WON
KR24 patents
⚠️ This page may combine multiple inventors who share the name “JUNG DONG-WON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
15 patentsUS6537727B2Mar 25, 2003
Resist composition comprising photosensitive polymer having loctone in its backbone
SAMSUNG ELECTRONICS CO LTD16 citations92
US6472120B1Oct 29, 2002
Photosensitive polymer and chemically amplified photoresist composition containing the same
SAMSUNG ELECTRONICS CO LTD16 citations92
US6300036B1Oct 9, 2001
Photosensitive polymers and chemically amplified photoresist compositions using the same
SAMSUNG ELECTRONICS CO LTD13 citations82
US6277538B1Aug 21, 2001
Photosensitive polymer having cyclic backbone and resist composition comprising the same
SAMSUNG ELECTRONICS CO LTD13 citations74
US6642336B1Nov 4, 2003
Photosensitive polymer
SAMSUNG ELECTRONICS CO LTD6 citations73
US6280903B1Aug 28, 2001
Chemically amplified resist composition
SAMSUNG ELECTRONICS CO LTD5 citations73
US6114084ASep 5, 2000
Chemically amplified resist composition
SAMSUNG ELECTRONICS CO LTD6 citations73
US6596459B1Jul 22, 2003
Photosensitive polymer and resist composition containing the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US6593441B2Jul 15, 2003
Photosensitive polymer and chemically amplified photoresist composition containing the same
SAMSUNG ELECTRONICS CO LTD1 citations62
US6287747B1Sep 11, 2001
Photosensitive polymer having cyclic backbone and resist composition comprising the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US6503687B2Jan 7, 2003
Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition
SAMSUNG ELECTRONICS CO LTD3 citations60
US7241552B2Jul 10, 2007
Resist composition comprising photosensitive polymer having lactone in its backbone
SAMSUNG ELECTRONICS CO LTD0 citations52
US7045267B2May 16, 2006
Resist composition comprising photosensitive polymer having lactone in its backbone
SAMSUNG ELECTRONICS CO LTD0 citations52
US7084227B2Aug 1, 2006
Photosensitive polymer and chemically amplified photoresist composition containing the same
SAMSUNG ELECTRONICS CO LTD0 citations51
US6893793B2May 17, 2005
Photosensitive polymer and chemically amplified photoresist composition containing the same
SAMSUNG ELECTRONICS CO LTD0 citations51
AUROS TECHNOLOGY INC
8 patentsUS12482688B2Nov 25, 2025
Overlay measurement device and method, and system and program therefor
AUROS TECHNOLOGY INC0 citations60
US12341047B2Jun 24, 2025
Overlay measurement device and method, and system and program therefor
AUROS TECHNOLOGY INC0 citations60
US12334382B2Jun 17, 2025
Overlay measurement device and method, and system and program therefor
AUROS TECHNOLOGY INC0 citations60
US12235590B2Feb 25, 2025
Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device therefor
AUROS TECHNOLOGY INC0 citations60
US12169364B2Dec 17, 2024
Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device therefor
AUROS TECHNOLOGY INC0 citations60
US12169365B2Dec 17, 2024
Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device therefor
AUROS TECHNOLOGY INC0 citations60
US12009243B2Jun 11, 2024
Overlay measurement device and method, and system and program therefor
AUROS TECHNOLOGY INC0 citations60
US11960214B1Apr 16, 2024
Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device therefor
AUROS TECHNOLOGY INC0 citations60