Inventor
MIYAZAWA SATORU
JP30 patents
⚠️ This page may combine multiple inventors who share the name “MIYAZAWA SATORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CENTRAL GLASS CO LTD
20 patentsUS6784312B2Aug 31, 2004
Fluorine-containing acrylate monomers
CENTRAL GLASS CO LTD45 citations95
US7402626B2Jul 22, 2008
Top coat composition
CENTRAL GLASS CO LTD31 citations92
US6858760B2Feb 22, 2005
Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method
CENTRAL GLASS CO LTD26 citations92
US7125641B2Oct 24, 2006
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD13 citations84
US7759440B2Jul 20, 2010
Fluorine-containing polymerisable monomer and polymer prepared by using same
CENTRAL GLASS CO LTD5 citations73
US7094850B2Aug 22, 2006
Fluorine-containing polymerizable monomer and polymer prepared by using same
CENTRAL GLASS CO LTD7 citations73
US7517635B2Apr 14, 2009
Polyester compound and resist material using the same
CENTRAL GLASS CO LTD2 citations63
US7125642B2Oct 24, 2006
Sulfonates, polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD6 citations63
US7005228B2Feb 28, 2006
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD2 citations63
US6933095B2Aug 23, 2005
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD3 citations63
US6414167B1Jul 2, 2002
Octafluorotricyclodecane derivatives and processes for producing same
CENTRAL GLASS CO LTD4 citations63
US12460031B2Nov 4, 2025
Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element
CENTRAL GLASS CO LTD0 citations60
US11939459B2Mar 26, 2024
Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element
CENTRAL GLASS CO LTD0 citations60
US7067691B2Jun 27, 2006
Process for producing α-substituted acrylic acid esters
CENTRAL GLASS CO LTD5 citations60
US7781602B2Aug 24, 2010
Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
CENTRAL GLASS CO LTD0 citations51
US7750178B2Jul 6, 2010
Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom
CENTRAL GLASS CO LTD0 citations51
US7173147B2Feb 6, 2007
Process for producing acrylic ester compound
CENTRAL GLASS CO LTD0 citations50
US11597696B2Mar 7, 2023
Method for purifying polymerizable fluoromonomer by distillation
CENTRAL GLASS CO LTD0 citations49
US7919224B2Apr 5, 2011
Coating materials consisting of low- or medium-molecular organic compounds
CENTRAL GLASS CO LTD0 citations42
US7385079B2Jun 10, 2008
Process for producing α-substituted acrylic norbornanyyl compounds
CENTRAL GLASS CO LTD0 citations38
SHINETSU CHEMICAL CO
8 patentsUS6875556B2Apr 5, 2005
Resist compositions and patterning process
SHINETSU CHEMICAL CO20 citations93
US6710148B2Mar 23, 2004
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO20 citations93
US6511787B2Jan 28, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO25 citations93
US6582880B2Jun 24, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO14 citations84
US6864037B2Mar 8, 2005
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO11 citations74
US7569323B2Aug 4, 2009
Resist protective coating material and patterning process
SHINETSU CHEMICAL CO4 citations63
US6861197B2Mar 1, 2005
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO6 citations63
US6790586B2Sep 14, 2004
Resist compositions and patterning process
SHINETSU CHEMICAL CO4 citations63