Inventor
Tan Taide
US7 patents
Patents
7 patentsUS11608559B2Mar 21, 2023
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
LAM RES CORP6 citations83
US10604841B2Mar 31, 2020
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
LAM RES CORP7 citations82
US12000047B2Jun 4, 2024
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
LAM RES CORP1 citations71
US11101164B2Aug 24, 2021
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
LAM RES CORP3 citations71
US11674226B2Jun 13, 2023
Separation of plasma suppression and wafer edge to improve edge film thickness uniformity
LAM RES CORP2 citations70
US12331402B2Jun 17, 2025
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
LAM RES CORP0 citations61
US11004662B2May 11, 2021
Temperature controlled spacer for use in a substrate processing chamber
LAM RES CORP0 citations44