Inventor
ENYAMA MOMOYO
JP33 patents
⚠️ This page may combine multiple inventors who share the name “ENYAMA MOMOYO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
19 patentsUS8350214B2Jan 8, 2013
Charged particle beam applied apparatus
HITACHI HIGH TECH CORP88 citations94
US7504624B2Mar 17, 2009
Charged particle beam device
HITACHI HIGH TECH CORP13 citations84
US11251011B2Feb 15, 2022
Electron microscope
HITACHI HIGH TECH CORP3 citations73
US10037866B2Jul 31, 2018
Charged particle beam apparatus
HITACHI HIGH TECH CORP5 citations73
US9704687B2Jul 11, 2017
Charged particle beam application device
HITACHI HIGH TECH CORP5 citations73
US11177108B2Nov 16, 2021
Charged particle beam application apparatus
HITACHI HIGH TECH CORP4 citations71
US9653256B2May 16, 2017
Charged particle-beam device
HITACHI HIGH TECH CORP4 citations71
US7755776B2Jul 13, 2010
Inspection system and inspection method
HITACHI HIGH TECH CORP3 citations63
US12481142B2Nov 25, 2025
Photoelectron emission microscope
HITACHI HIGH TECH CORP0 citations62
US12394586B2Aug 19, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US12205790B2Jan 21, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US12125667B2Oct 22, 2024
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US12057288B2Aug 6, 2024
Charged particle beam device and inspection method
HITACHI HIGH TECH CORP0 citations62
US11170969B2Nov 9, 2021
Electron beam observation device, electron beam observation system, and control method of electron beam observation device
HITACHI HIGH TECH CORP0 citations61
US11967482B2Apr 23, 2024
Charged particle beam device
HITACHI HIGH TECH CORP0 citations52
US11915903B2Feb 27, 2024
Electron beam application apparatus
HITACHI HIGH TECH CORP0 citations52
US12165828B2Dec 10, 2024
Electron gun and electron beam application apparatus
HITACHI HIGH TECH CORP0 citations50
US11791130B2Oct 17, 2023
Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation device
HITACHI HIGH TECH CORP0 citations50
US9384940B2Jul 5, 2016
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations41
HITACHI LTD
10 patentsUS10755396B2Aug 25, 2020
Image forming apparatus
HITACHI LTD1 citations62
US10319562B2Jun 11, 2019
Charged particle beam device
HITACHI LTD0 citations51
US10256068B2Apr 9, 2019
Charged particle beam apparatus
HITACHI LTD0 citations51
US10361063B2Jul 23, 2019
Charged particle detector and charged particle beam device using the same
HITACHI LTD0 citations50
US11380518B2Jul 5, 2022
Measurement system and method for setting observation conditions of measurement apparatus
HITACHI LTD0 citations47
US11334761B2May 17, 2022
Information processing system and information processing method
HITACHI LTD0 citations46
US10483083B2Nov 19, 2019
Scanning electron microscope and image processing apparatus
HITACHI LTD0 citations46
US10651004B2May 12, 2020
Charged particle beam device
HITACHI LTD0 citations41
US10629405B2Apr 21, 2020
Electron beam device and sample inspection method
HITACHI LTD0 citations41
US9991088B2Jun 5, 2018
Charged particle beam device and aberration corrector
HITACHI LTD0 citations41
ENYAMA MOMOYO
4 patentsUS8330103B2Dec 11, 2012
Charged particle beam apparatus and specimen inspection method
ENYAMA MOMOYO13 citations83
US8592776B2Nov 26, 2013
Charged particle beam apparatus
ENYAMA MOMOYO6 citations71
US8552373B2Oct 8, 2013
Charged particle beam device and sample observation method
ENYAMA MOMOYO2 citations61
US8907278B2Dec 9, 2014
Charged particle beam applied apparatus, and irradiation method
ENYAMA MOMOYO3 citations57