Inventor
TOIDA TAKUMI
JP13 patents
Patents
13 patentsUS11137686B2Oct 5, 2021
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
MITSUBISHI GAS CHEMICAL CO2 citations72
US10747112B2Aug 18, 2020
Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method
MITSUBISHI GAS CHEMICAL CO2 citations72
US11256170B2Feb 22, 2022
Compound, resist composition, and method for forming resist pattern using it
MITSUBISHI GAS CHEMICAL CO2 citations71
US11243467B2Feb 8, 2022
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
MITSUBISHI GAS CHEMICAL CO2 citations71
US10642156B2May 5, 2020
Resist base material, resist composition and method for forming resist pattern
MITSUBISHI GAS CHEMICAL CO2 citations71
US11143962B2Oct 12, 2021
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method
MITSUBISHI GAS CHEMICAL CO1 citations62
US11130724B2Sep 28, 2021
Compound, resin, composition, resist pattern formation method, and circuit pattern formation method
MITSUBISHI GAS CHEMICAL CO1 citations62
US10437148B2Oct 8, 2019
Resist material, resist composition and method for forming resist pattern
MITSUBISHI GAS CHEMICAL CO1 citations62
US11572430B2Feb 7, 2023
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
MITSUBISHI GAS CHEMICAL CO1 citations61
US11480877B2Oct 25, 2022
Resist composition, method for forming resist pattern, and polyphenol compound used therein
MITSUBISHI GAS CHEMICAL CO1 citations61
US11852970B2Dec 26, 2023
Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin
MITSUBISHI GAS CHEMICAL CO0 citations49
US11911341B2Feb 27, 2024
Multilayer vessel, and application thereof
MITSUBISHI GAS CHEMICAL CO0 citations46
US10745372B2Aug 18, 2020
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
MITSUBISHI GAS CHEMICAL CO0 citations41