Inventor

LEESER KARL F

US54 patents

⚠️ This page may combine multiple inventors who share the name “LEESER KARL F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEESER KARL F

LAM RES CORP

Selective inhibition in atomic layer deposition of silicon-containing films

Selective inhibition in atomic layer deposition of silicon-containing films

Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing

Rotational indexer with additional rotational axes

Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing

Wafer positioning pedestal for semiconductor processing

System for instantaneous radiofrequency power measurement and associated methods

Multi-station plasma reactor with RF balancing

Selective inhibition in atomic layer deposition of silicon-containing films

Wafer positioning pedestal for semiconductor processing

Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing

Wafer positioning pedestal for semiconductor processing

Wafer positioning pedestal for semiconductor processing

Wafer positioning pedestal for semiconductor processing

Multi-station plasma reactor with RF balancing

Radio frequency generator having multiple mutually exclusive oscillators for use in plasma processing

Pad raising mechanism in wafer positioning pedestal for semiconductor processing

Pad raising mechanism in wafer positioning pedestal for semiconductor processing

Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing

Multi-station plasma reactor with RF balancing

Common terminal heater for ceramic pedestals used in semiconductor for fabrication

Apparatus for thermal control of tubing assembly and associated methods

Apparatus for thermal control of tubing assembly and associated methods

Apparatus for thermal control of tubing assembly and associated methods

Pad raising mechanism in wafer positioning pedestal for semiconductor processing

Flow through line charge volume

Hardware and process for film uniformity improvement

Apparatus for thermal control of tubing assembly and associated methods

Hardware and process for film uniformity improvement

NOVELLUS SYSTEMS INC

Method and apparatus for improved temperature control in atomic layer deposition

Variable gas conductance control for a process chamber

Method for integrated in-situ cleaning and subsequent atomic layer deposition within a single processing chamber

Substrate temperature control in an ALD reactor

Variable gas conductance control for a process chamber

Varying conductance out of a process region to control gas flux in an ALD reactor

Hybrid ceramic showerhead

System for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)

Controlling the temperature of a substrate in a film deposition apparatus

Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)

ANGSTRON SYSTEMS INC

Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)

Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)

Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)

Adsorption process for atomic layer deposition

APPLIED MATERIALS INC

Method for rapidly dechucking a semiconductor wafer from an electrostatic chuck utilizing a hysteretic discharge cycle

Method and apparatus for controlling chucking force in an electrostatic

Method and apparatus for dechucking a workpiece from an electrostatic chuck

Backside gas delivery system for a semiconductor wafer processing system

SABRI MOHAMED

Hybrid ceramic showerhead

LEESER KARL F

Monowheel type vehicle

CHANDRASEKHARAN RAMESH

Point of use valve manifold for semiconductor fabrication equipment