Inventor

HUNG Min-Hsiu

TW30 patents

⚠️ This page may combine multiple inventors who share the name “HUNG Min-Hsiu”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HUNG Min-Hsiu

TAIWAN SEMICONDUCTOR MFG CO LTD

Metal liner overhang reduction and manufacturing method thereof

Fin field-effect transistor device and method of forming the same

Conductive feature formation and structure

Selective formation of titanium silicide and titanium nitride by hydrogen gas control

Conductive feature formation and structure

Fin field-effect transistor device and method of forming the same

Selective formation of titanium silicide and titanium nitride by hydrogen gas control

Formation method of interconnection structure of semiconductor device

Interconnect structures including a fin structure and a metal cap

Semiconductor device with low resistivity contact structure

Conductive feature formation and structure

Method of forming conductive feature including cleaning step

Conductive feature formation and structure

Method of forming conductive feature including cleaning step

Method of forming conductive feature including cleaning step

Selective formation of titanium silicide and titanium nitride by hydrogen gas control

Fin field-effect transistor device and method of forming the same

Selective formation of titanium silicide and titanium nitride by hydrogen gas control

Conductive feature structure including a blocking region

Barrier layer for an interconnect structure

Methods of forming semiconductor device structures

Method of fabricating contact structure

Formation method of semiconductor device structure with metal-semiconductor compound region

Contact features of semiconductor device and method of forming same

Conductive feature formation and structure

Conductive feature formation and structure

Semiconductor device structure with salicide layer and method for forming the same

Interconnect formation and structure

Semiconductor device with low resistivity contact structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG COMPANY LTD

Semiconductor devices and method of forming the same