Inventor
CHEN ZHIYING
US37 patents
⚠️ This page may combine multiple inventors who share the name “CHEN ZHIYING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
23 patentsUS10998169B2May 4, 2021
Systems and methods of control for plasma processing
TOKYO ELECTRON LTD44 citations98
US9209032B2Dec 8, 2015
Electric pressure systems for control of plasma properties and uniformity
TOKYO ELECTRON LTD42 citations94
US11728135B2Aug 15, 2023
Electric pressure systems for control of plasma properties and uniformity
TOKYO ELECTRON LTD2 citations73
US9288890B1Mar 15, 2016
Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma
TOKYO ELECTRON LTD5 citations73
US11264212B1Mar 1, 2022
Ion angle detector
TOKYO ELECTRON LTD2 citations69
US12580153B2Mar 17, 2026
Balanced resonator source for plasma processing
TOKYO ELECTRON LTD0 citations62
US11183398B2Nov 23, 2021
Ruthenium hard mask process
TOKYO ELECTRON LTD0 citations62
US11043362B2Jun 22, 2021
Plasma processing apparatuses including multiple electron sources
TOKYO ELECTRON LTD0 citations62
US11152194B2Oct 19, 2021
Plasma processing apparatuses having a dielectric injector
TOKYO ELECTRON LTD0 citations61
US11393662B2Jul 19, 2022
Apparatuses and methods for plasma processing
TOKYO ELECTRON LTD0 citations59
US12555756B2Feb 17, 2026
System and method to measure ion properties in a plasma system
TOKYO ELECTRON LTD0 citations58
US12014901B2Jun 18, 2024
Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
TOKYO ELECTRON LTD0 citations52
US11205562B2Dec 21, 2021
Hybrid electron beam and RF plasma system for controlled content of radicals and ions
TOKYO ELECTRON LTD0 citations52
US9978568B2May 22, 2018
Self-sustained non-ambipolar direct current (DC) plasma at low power
TOKYO ELECTRON LTD1 citations52
US9966239B2May 8, 2018
Non-ambipolar plasma enhanced DC/VHF phasor
TOKYO ELECTRON LTD0 citations52
US9947515B2Apr 17, 2018
Microwave surface-wave plasma device
TOKYO ELECTRON LTD0 citations52
US9793095B2Oct 17, 2017
Microwave surface-wave plasma device
TOKYO ELECTRON LTD0 citations52
US9697993B2Jul 4, 2017
Non-ambipolar plasma ehncanced DC/VHF phasor
TOKYO ELECTRON LTD0 citations52
US9668332B2May 30, 2017
Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma
TOKYO ELECTRON LTD1 citations52
US12487182B2Dec 2, 2025
Non-intrusive method for 2D/3D mapping plasma parameters
TOKYO ELECTRON LTD0 citations51
US11942307B2Mar 26, 2024
Plasma processing with radio frequency (RF) source and bias signal waveforms
TOKYO ELECTRON LTD0 citations51
US10388528B2Aug 20, 2019
Non-ambipolar electric pressure plasma uniformity control
TOKYO ELECTRON LTD0 citations42
US9111873B2Aug 18, 2015
Low profile magnetic filter
TOKYO ELECTRON LTD0 citations42
CHEN ZHIYING
5 patentsUS8486798B1Jul 16, 2013
Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof
CHEN ZHIYING6 citations83
USD993820SAug 1, 2023
Chain
CHEN ZHIYING2 citations72
US8721833B2May 13, 2014
Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereof
CHEN ZHIYING4 citations72
USD974948SJan 10, 2023
Pendant
CHEN ZHIYING1 citations61
US10395903B2Aug 27, 2019
Self-sustained non-ambipolar direct current (DC) plasma at low power
CHEN ZHIYING0 citations51