P

Inventor

LIN YAN-TING

TW23 patents
⚠️ This page may combine multiple inventors who share the name “LIN YAN-TING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

18 patents
US11075108B2Jul 27, 2021

Mechanism for FinFET well doping

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9406546B2Aug 2, 2016

Mechanism for FinFET well doping

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US10483396B1Nov 19, 2019

Interfacial layer between fin and source/drain region

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations83
US12080759B2Sep 3, 2024

Transistor source/drain regions and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11133416B2Sep 28, 2021

Methods of forming semiconductor devices having plural epitaxial layers

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10297492B2May 21, 2019

Mechanism for FinFET well doping

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US12191393B2Jan 7, 2025

Low Ge isolated epitaxial layer growth over nano-sheet architecture design for RP reduction

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations64
US12477794B2Nov 18, 2025

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11855142B2Dec 26, 2023

Supportive layer in source/drains of FinFET devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11742237B2Aug 29, 2023

Mechanism for FinFET well doping

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11476331B2Oct 18, 2022

Supportive layer in source/drains of FinFET devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11735668B2Aug 22, 2023

Interfacial layer between fin and source/drain region

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11482620B2Oct 25, 2022

Interfacial layer between Fin and source/drain region

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10944005B2Mar 9, 2021

Interfacial layer between fin and source/drain region

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12112975B2Oct 8, 2024

Mechanism for finFET well doping

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9559186B2Jan 31, 2017

Epitaxially grown stacked contact structure of semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10854715B2Dec 1, 2020

Supportive layer in source/drains of FinFET devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11942550B2Mar 26, 2024

Nanosheet semiconductor device and method for manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47

TAIWAN SEMICONDUCTOR MFG

2 patents

INER AEC EXECUTIVE YUAN

1 patent

INSTITUTE OF NUCLEAR ENNERGY RES ATOMIC ENERGY COUNCIL EXECUTIVE YUAN R O C

1 patent

LIN YAN-TING

1 patent