Inventor
LIN YAN-TING
TW23 patents
⚠️ This page may combine multiple inventors who share the name “LIN YAN-TING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
18 patentsUS11075108B2Jul 27, 2021
Mechanism for FinFET well doping
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9406546B2Aug 2, 2016
Mechanism for FinFET well doping
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US10483396B1Nov 19, 2019
Interfacial layer between fin and source/drain region
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations83
US12080759B2Sep 3, 2024
Transistor source/drain regions and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11133416B2Sep 28, 2021
Methods of forming semiconductor devices having plural epitaxial layers
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10297492B2May 21, 2019
Mechanism for FinFET well doping
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US12191393B2Jan 7, 2025
Low Ge isolated epitaxial layer growth over nano-sheet architecture design for RP reduction
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations64
US12477794B2Nov 18, 2025
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11855142B2Dec 26, 2023
Supportive layer in source/drains of FinFET devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11742237B2Aug 29, 2023
Mechanism for FinFET well doping
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11476331B2Oct 18, 2022
Supportive layer in source/drains of FinFET devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11735668B2Aug 22, 2023
Interfacial layer between fin and source/drain region
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11482620B2Oct 25, 2022
Interfacial layer between Fin and source/drain region
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10944005B2Mar 9, 2021
Interfacial layer between fin and source/drain region
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12112975B2Oct 8, 2024
Mechanism for finFET well doping
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9559186B2Jan 31, 2017
Epitaxially grown stacked contact structure of semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10854715B2Dec 1, 2020
Supportive layer in source/drains of FinFET devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11942550B2Mar 26, 2024
Nanosheet semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47