Inventor

TSAI PANG-YEN

TW97 patents

⚠️ This page may combine multiple inventors who share the name “TSAI PANG-YEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TSAI PANG-YEN

TAIWAN SEMICONDUCTOR MFG CO LTD

Structure and formation method of semiconductor device with high contact area

Epitaxial backside contact

Self-aligned inner spacer on gate-all-around structure and methods of forming the same

Semiconductor device structure with high contact area

Semiconductor device

Interface profile control in epitaxial structures for semiconductor devices

Selective dual silicide formation using a maskless fabrication process flow

Method of forming contact plugs for semiconductor device

Semiconductor device and manufacturing method thereof

Semiconductor device, interconnection structure and method for forming the same

Semiconductor device and manufacturing method thereof

Low Ge isolated epitaxial layer growth over nano-sheet architecture design for RP reduction

Gate all around (GAA) transistor structures having a plurality of semiconductor nanostructures

Semiconductor device having spacer residue

Semiconductor device having cap layer

Semiconductor device and manufacturing method thereof

Epitaxial structure for source/drain contact for semiconductor structure having fin structure

Strained nanosheets on silicon-on-insulator substrate

Contact plugs for semiconductor device and method of forming same

Epitaxial layers in source/drain contacts and methods of forming the same

Channel structures for semiconductor devices

Backside contact structures with stacked metal silicide layers for source/drain region of fin field transistors

Channel mobility improvement

Epitaxial backside contact

TAIWAN SEMICONDUCTOR MFG

Stack SiGe for short channel improvement

Epitaxy silicon on insulator (ESOI)

Super anneal for process induced strain modulation

High performance CMOS device design

Method and apparatus for removing coating layers from alignment marks on a wafer

Structure and method and FinFET device

Epitaxy silicon on insulator (ESOI)

Multi-step epitaxial process for depositing Si/SiGe

PMOS transistor with discontinuous CESL and method of fabrication

Epitaxy layer and method of forming the same

Epitaxy layer and method of forming the same

Methods of forming epitaxial structures

Epitaxy silicon on insulator (ESOI)

Method of forming a MOS device with an additional layer

Short channel effect engineering in MOS device using epitaxially carbon-doped silicon

Method of depositing an epitaxial layer of SiGe subsequent to a plasma etch

(unassigned)

Toilet tank having a two-stage flushing device

Water-saving toilet

Flush device for toilet

Flush device for water closet

Flush device for toilet

CHEN YUN-HSIU

Method of manufacturing strained-silicon semiconductor device

LIN CHIN-HSIANG

Source/drain stressor having enhanced carrier mobility manufacturing same

VANGUARD INT SEMICONDUCT CORP

High stress oxide to eliminate BPSG/SiN cracking

SU LILLY

Semiconductor device and fabrication method thereof

LEE YEN-RU

Semiconductor device and fabrication method thereof