Inventor
SACHDEV HARBANS S
US25 patents
⚠️ This page may combine multiple inventors who share the name “SACHDEV HARBANS S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
24 patentsUS5114826AMay 19, 1992
Photosensitive polyimide compositions
IBM98 citations96
US5094769AMar 10, 1992
Compliant thermally conductive compound
IBM76 citations96
US4692205ASep 8, 1987
Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings
IBM149 citations96
US4599243AJul 8, 1986
Use of plasma polymerized organosilicon films in fabrication of lift-off masks
IBM73 citations96
US4562091ADec 31, 1985
Use of plasma polymerized orgaosilicon films in fabrication of lift-off masks
IBM55 citations96
US4519872AMay 28, 1985
Use of depolymerizable polymers in the fabrication of lift-off structure for multilevel metal processes
IBM64 citations96
US5312717AMay 17, 1994
Residue free vertical pattern transfer with top surface imaging resists
IBM78 citations95
US4772346ASep 20, 1988
Method of bonding inorganic particulate material
IBM65 citations94
US4493855AJan 15, 1985
Use of plasma polymerized organosilicon films in fabrication of lift-off masks
IBM48 citations93
US5422223AJun 6, 1995
Silicon-containing positive resist and use in multilayer metal structures
IBM50 citations92
US5399462AMar 21, 1995
Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane
IBM33 citations92
US5385804AJan 31, 1995
Silicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymer
IBM44 citations92
US5213704AMay 25, 1993
Process for making a compliant thermally conductive compound
IBM26 citations92
US5338818AAug 16, 1994
Silicon containing positive resist for DUV lithography
IBM44 citations91
US5322765AJun 21, 1994
Dry developable photoresist compositions and method for use thereof
IBM47 citations91
US5296332AMar 22, 1994
Crosslinkable aqueous developable photoresist compositions and method for use thereof
IBM49 citations90
US5240812AAug 31, 1993
Top coat for acid catalyzed resists
IBM35 citations90
US4978594ADec 18, 1990
Fluorine-containing base layer for multi-layer resist processes
IBM39 citations90
US4826564AMay 2, 1989
Method of selective reactive ion etching of substrates
IBM33 citations90
US4665006AMay 12, 1987
Positive resist system having high resistance to oxygen reactive ion etching
IBM21 citations82
US4525722AJun 25, 1985
Chemical heat amplification in thermal transfer printing
IBM25 citations79
US6635118B2Oct 21, 2003
Aqueous cleaning of polymer apply equipment
IBM16 citations73
US4286989ASep 1, 1981
Formulations for ink jet printing
IBM6 citations68
US4371565AFeb 1, 1983
Process for adhering an organic resin to a substrate by means of plasma polymerized phosphines
IBM4 citations61