Inventor
LAURSEN THOMAS
US16 patents
⚠️ This page may combine multiple inventors who share the name “LAURSEN THOMAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SPEEDFAM IPEC CORP
7 patentsUS6258711B1Jul 10, 2001
Sacrificial deposit to improve damascene pattern planarization in semiconductor wafers
SPEEDFAM IPEC CORP42 citations92
US6960115B2Nov 1, 2005
Multiprobe detection system for chemical-mechanical planarization tool
SPEEDFAM IPEC CORP19 citations91
US6805613B1Oct 19, 2004
Multiprobe detection system for chemical-mechanical planarization tool
SPEEDFAM IPEC CORP17 citations91
US7314402B2Jan 1, 2008
Method and apparatus for controlling slurry distribution
SPEEDFAM IPEC CORP15 citations90
US6923711B2Aug 2, 2005
Multizone carrier with process monitoring system for chemical-mechanical planarization tool
SPEEDFAM IPEC CORP25 citations89
US6521537B1Feb 18, 2003
Modification to fill layers for inlaying semiconductor patterns
SPEEDFAM IPEC CORP10 citations73
US6387188B1May 14, 2002
Pad conditioning for copper-based semiconductor wafers
SPEEDFAM IPEC CORP5 citations60
NOVELLUS SYSTEMS INC
5 patentsUS7115017B1Oct 3, 2006
Methods for controlling the pressures of adjustable pressure zones of a work piece carrier during chemical mechanical planarization
NOVELLUS SYSTEMS INC272 citations95
US7264537B1Sep 4, 2007
Methods for monitoring a chemical mechanical planarization process of a metal layer using an in-situ eddy current measuring system
NOVELLUS SYSTEMS INC19 citations90
US6821794B2Nov 23, 2004
Flexible snapshot in endpoint detection
NOVELLUS SYSTEMS INC33 citations87
US7887396B2Feb 15, 2011
Method and apparatus for controlled slurry distribution
NOVELLUS SYSTEMS INC8 citations82
US7622052B1Nov 24, 2009
Methods for chemical mechanical planarization and for detecting endpoint of a CMP operation
NOVELLUS SYSTEMS INC0 citations34