Inventor
OLUSEYI HAKEEM M
US2 patents
Patents
2 patentsUS6933243B2Aug 23, 2005
High selectivity and residue free process for metal on thin dielectric gate etch application
APPLIED MATERIALS INC8 citations71
US6943053B2Sep 13, 2005
System, method and medium for modeling, monitoring and/or controlling plasma based semiconductor manufacturing processes
APPLIED MATERIALS INC4 citations54