Inventor
INUMIYA SEIJI
JP51 patents
⚠️ This page may combine multiple inventors who share the name “INUMIYA SEIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
39 patentsUS6251763B1Jun 26, 2001
Semiconductor device and method for manufacturing same
TOSHIBA KK114 citations99
US6054355AApr 25, 2000
Method of manufacturing a semiconductor device which includes forming a dummy gate
TOSHIBA KK338 citations99
US6515338B1Feb 4, 2003
Semiconductor device and manufacturing method therefor
TOSHIBA KK82 citations98
US6784508B2Aug 31, 2004
Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof
TOSHIBA KK65 citations96
US6664592B2Dec 16, 2003
Semiconductor device with groove type channel structure
TOSHIBA KK60 citations96
US9362487B2Jun 7, 2016
Ferroelectric memory and manufacturing method of the same
TOSHIBA KK32 citations94
US6924536B2Aug 2, 2005
Semiconductor device and its manufacturing method
TOSHIBA KK25 citations93
US6844234B2Jan 18, 2005
Semiconductor device and method for manufacturing semiconductor device
TOSHIBA KK21 citations93
US6787827B2Sep 7, 2004
Semiconductor device and method for manufacturing the same
TOSHIBA KK30 citations93
US6383856B2May 7, 2002
Semiconductor device and method for manufacturing the same
TOSHIBA KK16 citations93
US6294481B1Sep 25, 2001
Semiconductor device and method for manufacturing the same
TOSHIBA KK33 citations93
US6017809AJan 25, 2000
Method of manufacturing semiconductor device
TOSHIBA KK41 citations93
US7306994B2Dec 11, 2007
Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof
TOSHIBA KK15 citations92
US7947610B2May 24, 2011
Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof
TOSHIBA KK10 citations84
US7375403B2May 20, 2008
Semiconductor device and method of manufacturing the same
TOSHIBA KK11 citations84
US7294878B2Nov 13, 2007
Semiconductor memory device and method of manufacturing the same
TOSHIBA KK13 citations84
US7265427B2Sep 4, 2007
Semiconductor apparatus and method of manufacturing the semiconductor apparatus
TOSHIBA KK5 citations74
US6403997B1Jun 11, 2002
Method for manufacturing semiconductor devices
TOSHIBA KK11 citations74
US10985104B2Apr 20, 2021
Semiconductor device having electrode pad and electrode layer intervening semiconductor layer inbetween and manufacturing method thereof
TOSHIBA KK0 citations63
US8039333B2Oct 18, 2011
Semiconductor device and method of fabricating the same
TOSHIBA KK2 citations63
US7989896B2Aug 2, 2011
Semiconductor device and method of fabricating the same
TOSHIBA KK2 citations63
US7816215B2Oct 19, 2010
Semiconductor device manufacturing method
TOSHIBA KK3 citations63
US7727832B2Jun 1, 2010
Semiconductor device and method for manufacturing the same
TOSHIBA KK2 citations63
US7687869B2Mar 30, 2010
Semiconductor device and method of manufacturing the same
TOSHIBA KK2 citations63
US7652341B2Jan 26, 2010
Semiconductor apparatus having a semicondutor element with a high dielectric constant film
TOSHIBA KK2 citations63
US7521263B2Apr 21, 2009
Method of forming an insulating film, method of manufacturing a semiconductor device, and semiconductor device
TOSHIBA KK2 citations63
US7501335B2Mar 10, 2009
Semiconductor device and manufacturing method of the same
TOSHIBA KK2 citations63
US7368780B2May 6, 2008
Semiconductor memory device and method of manufacturing the same
TOSHIBA KK4 citations63
US7141466B2Nov 28, 2006
Method of fabricating semiconductor device having gate insulating film comprising a silicate nitride film with interface insulating film
TOSHIBA KK2 citations63
US7129125B2Oct 31, 2006
Semiconductor device and manufacturing method thereof including heating a silicon oxide in a helium gas
TOSHIBA KK2 citations63
US7091135B2Aug 15, 2006
Method of manufacturing semiconductor device
TOSHIBA KK6 citations63
US10381471B2Aug 13, 2019
Semiconductor device and manufacturing method
TOSHIBA KK0 citations52
US7968397B2Jun 28, 2011
Semiconductor device and method of manufacturing the same
TOSHIBA KK0 citations52
US7858536B2Dec 28, 2010
Semiconductor device and method for manufacturing semiconductor device
TOSHIBA KK0 citations52
US7824976B2Nov 2, 2010
Semiconductor apparatus and method of manufacturing the semiconductor apparatus
TOSHIBA KK0 citations52
US7427518B2Sep 23, 2008
Semiconductor device fabrication method and fabrication apparatus
TOSHIBA KK0 citations52
US7282774B2Oct 16, 2007
Semiconductor device and method for manufacturing semiconductor device
TOSHIBA KK0 citations52
US7101775B2Sep 5, 2006
Semiconductor device and method for manufacturing semiconductor device
TOSHIBA KK0 citations52
US7220681B2May 22, 2007
Semiconductor device and method of fabricating the same
TOSHIBA KK0 citations42
INUMIYA SEIJI
4 patentsUS8143676B2Mar 27, 2012
Semiconductor device having a high-dielectric-constant gate insulating film
INUMIYA SEIJI6 citations72
US8071447B2Dec 6, 2011
Semiconductor device manufacturing method
INUMIYA SEIJI2 citations61
US8435858B2May 7, 2013
Semiconductor device manufacturing method
INUMIYA SEIJI0 citations51
US8183641B2May 22, 2012
Semiconductor device and method for manufacturing same
INUMIYA SEIJI1 citations51
KANEKO AKIO
2 patentsKOYAMA MASATO
2 patentsTOKYO ELECTRON LTD
1 patentTOSHIBA MEMORY CORP
1 patentTANAKA MASAYUKI
1 patentShowing the top 50 of 51 patents by PatentIndex Score.