Inventor
JOUBERT OLIVIER
FR29 patents
⚠️ This page may combine multiple inventors who share the name “JOUBERT OLIVIER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
13 patentsUS10685807B2Jun 16, 2020
Creating ion energy distribution functions (IEDF)
APPLIED MATERIALS INC38 citations98
US10312048B2Jun 4, 2019
Creating ion energy distribution functions (IEDF)
APPLIED MATERIALS INC48 citations97
USD797691SSep 19, 2017
Composite edge ring
APPLIED MATERIALS INC59 citations97
US9725302B1Aug 8, 2017
Wafer processing equipment having exposable sensing layers
APPLIED MATERIALS INC18 citations91
US11728124B2Aug 15, 2023
Creating ion energy distribution functions (IEDF)
APPLIED MATERIALS INC5 citations86
US11069504B2Jul 20, 2021
Creating ion energy distribution functions (IEDF)
APPLIED MATERIALS INC7 citations84
US9975758B2May 22, 2018
Wafer processing equipment having exposable sensing layers
APPLIED MATERIALS INC8 citations83
US9257293B2Feb 9, 2016
Methods of forming silicon nitride spacers
APPLIED MATERIALS INC10 citations82
US6238844B1May 29, 2001
Process for depositing a plasma polymerized organosilicon photoresist film
APPLIED MATERIALS INC11 citations73
US9818621B2Nov 14, 2017
Cyclic oxide spacer etch process
APPLIED MATERIALS INC2 citations67
US8956886B2Feb 17, 2015
Embedded test structure for trimming process control
APPLIED MATERIALS INC2 citations62
US11049760B2Jun 29, 2021
Universal process kit
APPLIED MATERIALS INC0 citations52
US10109464B2Oct 23, 2018
Minimization of ring erosion during plasma processes
APPLIED MATERIALS INC0 citations52
COMMISSARIAT ENERGIE ATOMIQUE
6 patentsUS9570317B2Feb 14, 2017
Microelectronic method for etching a layer
COMMISSARIAT ENERGIE ATOMIQUE14 citations83
US9378970B2Jun 28, 2016
Plasma etching process
COMMISSARIAT ENERGIE ATOMIQUE9 citations76
US10056266B2Aug 21, 2018
Method for manufacturing a resistive device for a memory or logic circuit
COMMISSARIAT ENERGIE ATOMIQUE5 citations72
US9583339B2Feb 28, 2017
Method for forming spacers for a transistor gate
COMMISSARIAT ENERGIE ATOMIQUE4 citations71
US6818488B2Nov 16, 2004
Process for making a gate for a short channel CMOS transistor structure
COMMISSARIAT ENERGIE ATOMIQUE9 citations67
US9048011B2Jun 2, 2015
Method of obtaining patters in an antireflective layer
COMMISSARIAT ENERGIE ATOMIQUE0 citations41
FRANCE TELECOM
3 patentsUS6271144B1Aug 7, 2001
Process for etching a polycrystalline Si(1-x)Ge(x) layer or a stack of polycrystalline Si(1-x)Ge(x) layer and of a polycrystalline Si layer, and its application to microelectronics
FRANCE TELECOM24 citations90
US6326302B1Dec 4, 2001
Process for the anisotropic etching of an organic dielectric polymer material by a plasma gas and application in microelectronics
FRANCE TELECOM15 citations80
US6589715B2Jul 8, 2003
Process for depositing and developing a plasma polymerized organosilicon photoresist film
FRANCE TELECOM10 citations73