Inventor
HSU CHIH-YU
TW35 patents
⚠️ This page may combine multiple inventors who share the name “HSU CHIH-YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
22 patentsUS9953975B2Apr 24, 2018
Methods for forming STI regions in integrated circuits
TAIWAN SEMICONDUCTOR MFG CO LTD11 citations82
US11996484B2May 28, 2024
Nano-sheet-based complementary metal-oxide-semiconductor devices with asymmetric inner spacers
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations75
US12255104B2Mar 18, 2025
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations74
US12040405B2Jul 16, 2024
Multi-gate device and related methods
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations74
US9472672B2Oct 18, 2016
Eliminating fin mismatch using isolation last
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US12142657B2Nov 12, 2024
Gate structure for multi-gate device and related methods
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations69
US12294030B2May 6, 2025
Nano-sheet-based complementary metal-oxide-semiconductor devices with asymmetric inner spacers
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations64
US12463040B2Nov 4, 2025
Methods for doping high-K metal gates for tuning threshold voltages
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12302604B2May 13, 2025
Multi-gate device and related methods
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12272557B2Apr 8, 2025
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12171091B2Dec 17, 2024
Multi-layer high-k gate dielectric structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12041760B2Jul 16, 2024
Multi-layer high-k gate dielectric structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12040235B2Jul 16, 2024
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11862468B2Jan 2, 2024
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11450661B2Sep 20, 2022
Forming STI regions to separate semiconductor Fins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11437280B2Sep 6, 2022
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11342188B2May 24, 2022
Methods for doping high-k metal gates for tuning threshold voltages
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12433011B2Sep 30, 2025
Post gate dielectric processing for semiconductor device fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11735484B2Aug 22, 2023
Post gate dielectric processing for semiconductor device fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12074206B2Aug 27, 2024
Integrated circuit device with improved reliability
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12022643B2Jun 25, 2024
Multi-layer high-k gate dielectric structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12453165B2Oct 21, 2025
P-type semiconductor devices with different threshold voltages and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
REALTEK SEMICONDUCTOR CORP
5 patentsUS10551905B1Feb 4, 2020
Data-transmission-format conversion circuit and control method for data-transmission-format conversions between different high-speed data transmission interfaces
REALTEK SEMICONDUCTOR CORP3 citations69
US11281516B2Mar 22, 2022
Error handling method and associated error handling architecture for transmission interfaces
REALTEK SEMICONDUCTOR CORP1 citations59
US11126233B2Sep 21, 2021
Interface bridge circuit capable of reducing heat generation
REALTEK SEMICONDUCTOR CORP0 citations48
US9779476B2Oct 3, 2017
Image signal processing method and image signal processor for noise reduction
REALTEK SEMICONDUCTOR CORP0 citations41
US10684668B2Jun 16, 2020
USB interface system capable of automatically adjusting connection speed and power consumption capabilities and method thereof
REALTEK SEMICONDUCTOR CORP0 citations38
AIR LIQUIDE
3 patentsUS10529581B2Jan 7, 2020
SiN selective etch to SiO2 with non-plasma dry process for 3D NAND device applications
AIR LIQUIDE9 citations82
US12106940B2Oct 1, 2024
Systems and methods for storage and supply of F3NO-free FNO gases and F3NO-free FNO gas mixtures for semiconductor processes
AIR LIQUIDE0 citations46
US10347498B2Jul 9, 2019
Methods of minimizing plasma-induced sidewall damage during low K etch processes
AIR LIQUIDE0 citations41