Inventor

MATSUBARA YOSHIHISA

JP66 patents

⚠️ This page may combine multiple inventors who share the name “MATSUBARA YOSHIHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MATSUBARA YOSHIHISA

NEC CORP

Semiconductor device with alloy film between barrier metal and interconnect

Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film

Semiconductor device with salicide structure and fabrication method thereof

Method for forming a refractory metal silicide layer

Method for forming a refractory metal silicide layer

Process for forming multilevel interconnection structure

Process for forming a planarized interlayer insulating film in a semiconductor device using a periodic resist pattern

Method for planarizing insulating film

Fabrication method of semiconductor device with refractory metal silicide formation by removing native oxide in hydrogen

Semiconductor device formed with metal wiring on a wafer by chemical mechanical polishing, and method of manufacturing the same

Method of forming multi-level copper interconnect with formation of copper oxide on exposed copper surface

Apparatus for forming films of a semiconductor device, a method of manufacturing a semiconductor device, and a method of forming thin films of a semiconductor

Process of fabricating semiconductor device having low-resistive titanium silicide layer free from short-circuit and leakage current

Wiring structure in a semiconductor device

Semiconductor device and a manufacturing process therefor

Semiconductor device capable of having amorphous carbon fluoride film of low dielectric constant as interlayer insulation material and method of manufacturing the same

Semiconductor device with salicide structure and fabrication method thereof

Method of forming a semiconductor device

Semiconductor device and method of manufacturing the same

Method of forming a self-aligned refractory metal silicide layer

Fabrication method of semiconductor device equipped with silicide layer

Semiconductor device having amorphous carbon fluoride film of low dielectric constant as interlayer insulation material

Method for forming interconnection structure

Method of forming silicide film

Method for producing a semiconductor device comprising a refractory metal silicide layer

Method of manufacturing semiconductor device

Test piece for X-ray inspection

Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film, and a method for manufacturing the semiconductor device

Process for manufacturing semiconductor device and exposure mask

Method for manufacturing a multilayer interconnection structure

Method of forming a self-aligned refractory metal silicide contact using doped field oxide regions

Method for manufacturing semiconductor device comprising a silicide film

Simulation method of silicide reaction for use with production of semiconductor devices

NEC ELECTRONICS CORP

Semiconductor device and manufacturing method thereof

Semiconductor device having multilayer structure and method for manufacturing thereof

Semiconductor device having bonding pad above low-k dielectric film

Semiconductor device and manufacturing method of the same

Method of making a semiconductor device with alloy film between barrier metal and interconnect

Semiconductor device and method of manufacturing interconnections thereof using copper and tungsten in predetermined ratios

RENESAS ELECTRONICS CORP

Semiconductor device and process for manufacturing same

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method thereof

Semiconductor device

Semiconductor device including copper wiring and via wiring having length longer than width thereof and method of manufacturing the same

Semiconductor device

MATSUBARA YOSHIHISA

Semiconductor device and method of manufacturing the same

Semiconductor device and manufacturing method of the semiconductor device

Semiconductor device, method of manufacturing the same, and method of designing the same

RENESAS TECH CORP

Method of transporting semiconductor device and method of manufacturing semiconductor device

OHNISHI SHINTARO

Helicopter