Inventor
ORIHASHI YUGO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “ORIHASHI YUGO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
18 patentsUS9508543B2Nov 29, 2016
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC10 citations84
US9218959B2Dec 22, 2015
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC6 citations84
US9190298B2Nov 17, 2015
Film forming method and recording medium for performing the method
HITACHI INT ELECTRIC INC5 citations84
US9054046B2Jun 9, 2015
Method of manufacturing semiconductor device and method of processing substrate
HITACHI INT ELECTRIC INC10 citations84
US9412587B2Aug 9, 2016
Method of manufacturing semiconductor device, substrate processing apparatus, gas supply system, and recording medium
HITACHI INT ELECTRIC INC4 citations83
US8987146B2Mar 24, 2015
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC6 citations80
US9460911B2Oct 4, 2016
Method of manufacturing semiconductor device and substrate processing method
HITACHI INT ELECTRIC INC4 citations73
US9691609B2Jun 27, 2017
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC2 citations72
US9837261B2Dec 5, 2017
Method of manufacturing semiconductor device and substrate processing method
HITACHI INT ELECTRIC INC1 citations63
US9941119B2Apr 10, 2018
Method of forming silicon layer in manufacturing semiconductor device and recording medium
HITACHI INT ELECTRIC INC1 citations61
US9520282B2Dec 13, 2016
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC1 citations52
US9460916B2Oct 4, 2016
Method of manufacturing semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations52
US10262857B2Apr 16, 2019
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC0 citations51
US10090152B2Oct 2, 2018
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC1 citations51
US9997354B2Jun 12, 2018
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC1 citations51
US9540728B2Jan 10, 2017
Substrate processing apparatus, apparatus for manufacturing semiconductor device, and gas supply system
HITACHI INT ELECTRIC INC0 citations51
US9899211B2Feb 20, 2018
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations48
US10134584B2Nov 20, 2018
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC0 citations41
KOKUSAI ELECTRIC CORP
2 patentsUS11164744B2Nov 2, 2021
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations62
US12503762B2Dec 23, 2025
Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations48