Inventor
IMONIGIE JEROME A
US19 patents
⚠️ This page may combine multiple inventors who share the name “IMONIGIE JEROME A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
17 patentsUS9653307B1May 16, 2017
Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structures
MICRON TECHNOLOGY INC23 citations93
US10916418B2Feb 9, 2021
Using sacrificial polymer materials in semiconductor processing
MICRON TECHNOLOGY INC2 citations71
US10497558B2Dec 3, 2019
Using sacrificial polymer materials in semiconductor processing
MICRON TECHNOLOGY INC3 citations71
US11393688B2Jul 19, 2022
Semiconductor contact formation
MICRON TECHNOLOGY INC1 citations62
US12015080B2Jun 18, 2024
Integrated assemblies and methods of forming integrated assemblies
MICRON TECHNOLOGY INC0 citations61
US11651952B2May 16, 2023
Using sacrificial polymer materials in semiconductor processing
MICRON TECHNOLOGY INC0 citations60
US11127588B2Sep 21, 2021
Semiconductor processing applying supercritical drying
MICRON TECHNOLOGY INC0 citations60
US11848360B2Dec 19, 2023
Integrated assemblies and methods of forming integrated assemblies
MICRON TECHNOLOGY INC0 citations59
US11404267B2Aug 2, 2022
Semiconductor structure formation
MICRON TECHNOLOGY INC0 citations56
US10978306B2Apr 13, 2021
Semiconductor recess formation
MICRON TECHNOLOGY INC0 citations55
US9614153B2Apr 4, 2017
Methods of selectively doping chalcogenide materials and methods of forming semiconductor devices
MICRON TECHNOLOGY INC0 citations52
US10479938B2Nov 19, 2019
Removing polysilicon
MICRON TECHNOLOGY INC0 citations51
US10113113B2Oct 30, 2018
Removing polysilicon
MICRON TECHNOLOGY INC0 citations51
US9650570B2May 16, 2017
Compositions for etching polysilicon
MICRON TECHNOLOGY INC0 citations51
US9593297B2Mar 14, 2017
Compositions for removing residues and related methods
MICRON TECHNOLOGY INC0 citations50
US11361972B2Jun 14, 2022
Methods for selectively removing more-doped-silicon-dioxide relative to less-doped-silicon-dioxide
MICRON TECHNOLOGY INC0 citations43
US10777561B2Sep 15, 2020
Semiconductor structure formation
MICRON TECHNOLOGY INC0 citations39
IMONIGIE JEROME A
2 patentsUS8962460B2Feb 24, 2015
Methods of selectively forming metal-doped chalcogenide materials, methods of selectively doping chalcogenide materials, and methods of forming semiconductor device structures including same
IMONIGIE JEROME A5 citations81
US9012318B2Apr 21, 2015
Etching polysilicon
IMONIGIE JEROME A0 citations48