Inventor
YEOM GEUN YOUNG
KR25 patents
⚠️ This page may combine multiple inventors who share the name “YEOM GEUN YOUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV
7 patentsUS10593819B2Mar 17, 2020
Semiconductor device, photoelectronic device, and method for manufacturing transition-metal dichalcogenide thin film
RESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV2 citations71
US10916670B2Feb 9, 2021
Semiconductor device, photoelectronic device, and method for manufacturing transition-metal dichalcogenide thin film
RESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV0 citations60
US11127570B2Sep 21, 2021
Plasma source and plasma generation apparatus using the same
RESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV0 citations59
US12148626B2Nov 19, 2024
Dry etching method using potential control of grid and substrate
RESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV1 citations54
US11424375B2Aug 23, 2022
Photoelectronic device, photodiode, and phototransistor
RESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV0 citations50
US11120975B2Sep 14, 2021
Ion beam etching apparatus
RESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV0 citations45
US10784082B2Sep 22, 2020
Apparatus for generating plasma and apparatus for treating substrate having the same
RESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV0 citations39
UNIV SUNGKYUNKWAN
5 patentsUS6926799B2Aug 9, 2005
Etching apparatus using neutral beam
UNIV SUNGKYUNKWAN19 citations90
US6933495B1Aug 23, 2005
3-grid neutral beam source used for etching semiconductor device
UNIV SUNGKYUNKWAN14 citations83
US7094702B2Aug 22, 2006
Layer-by-layer etching apparatus using neutral beam and method of etching using the same
UNIV SUNGKYUNKWAN6 citations71
US7060931B2Jun 13, 2006
Neutral beam source having electromagnet used for etching semiconductor device
UNIV SUNGKYUNKWAN7 citations68
US6874443B2Apr 5, 2005
Layer-by-layer etching apparatus using neutral beam and etching method using the same
UNIV SUNGKYUNKWAN5 citations60
UNIV SUNGKYUNKWAN FOUND
3 patentsUS7799706B2Sep 21, 2010
Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same
UNIV SUNGKYUNKWAN FOUND420 citations98
US7919142B2Apr 5, 2011
Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the same
UNIV SUNGKYUNKWAN FOUND426 citations96
US7842159B2Nov 30, 2010
Inductively coupled plasma processing apparatus for very large area using dual frequency
UNIV SUNGKYUNKWAN FOUND4 citations61